System and method for updating an arm scan profile through a graphical user interface

ABSTRACT

A system and method for performing a wet etching process is disclosed. The system includes multiple processing stations accessible by a transfer device, including a measuring station to optically measure the thickness of a wafer before and after each etching steps in the process. The system also includes a controller to analyze the thickness measurements in view of a target wafer profile and generate an etch recipe, dynamically and in real time, for each etching step. In addition, the process controller can cause a single wafer wet etching station to etch the wafer according to the generated etching recipes. In addition, the system can, based on the pre and post-etch thickness measurements and target etch profile, generate and/or refine the etch recipes.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application claims priority to U.S. patent application Ser.No. 62/073,727, filed Oct. 31, 2014, which is hereby incorporated byreference in its entirety.

TECHNICAL FIELD

The present invention generally relates to a system and method foretching semiconductor wafers for integrated circuits and, morespecifically, relates to a system and method for etching semiconductorwafers (integrated circuit substrates) using a wet etching process thatresults in the etching of the wafer to a precise and uniform thickness.In accordance with the present invention, the wet etching process can bea two-stage process.

BACKGROUND

2.5 and 3D Integration is becoming a reality in device manufacturing. Acritical process step is the thinning of the silicon wafer to reveal themetal filled Through Silicon Via (TSV). Grinding is used to remove thebulk of the silicon wafer. Currently a multistep sequence of processesthat includes chemical mechanical planarization (CMP) and plasma etchinghas been used to complete the final thinning of the silicon. However,this conventional process has a number of disadvantages associatedtherewith including but not limited to the complexity of the process andthe associated costs. As described hereinafter, the present invention isdirected at overcoming these deficiencies associated with theconventional process by providing a simple, cost effective method to wetetch the remaining silicon to reveal the TSVs.

TSV wafers (wafers are also referred to herein as substrates) aremanufactured by creating vias (holes) in the top surface of the wafer.These vias extend part way through the thickness of the wafer. The holesare then filled in with a conductive material (studs), with or withoutan insulating liner. The conductor-filled vias are referred to herein asTSVs. The bottom side of the wafer, opposite of where the TSVs werecreated, is then put through a grind process where mechanical grindingreduces the thickness of the substrate, effectively reducing thedistance from the bottom of the via to the bottom surface of thesubstrate. Complete grinding of the substrate to expose the conductor isundesired as this would result in ions from the conductive materialbeing smeared across the substrate surface, thereby altering theelectrical properties at the contaminated sites and reducing yield. Anynumber of manufacturing steps can be performed on the top side of thewafer prior to further processing of the bottom side depending on theapplication. For example, for a device wafer, the full device structureand metallurgical components can be added to the top surface of thewafer. For 2.5D interposer applications, the top sidewiring/interconnects can be completed. The wafer with TSVs is thentypically mounted using an adhesive layer on a carrier wafer with thetop of the wafer toward the carrier wafer.

The grinding process leaves a layer of substrate material above the TSVsthat can have variations in thickness that is radially dependent, forinstance, thicker at the edge of the wafer, uniform across the wafer orthicker at the center of the wafer than at the edge (within waferthickness variation). Likewise there can be a difference in height ofthe substrate material above the TSVs on a wafer to wafer basis (waferto wafer thickness variation). These differences in the layer above theTSVs can be greater than the allowable difference in height of theexposed TSVs.

Integrated circuit wafers, which typically are in the form of flat rounddisks (although other shapes are possible) and often are made fromsilicon, Gallium Arsenide, or other materials, may be processed usingvarious chemicals. One process is the use of liquid chemical etchant toremove material from or on the substrate, this process is often referredto as wet etching. Commonly used methods include submerging the wafersin chemical baths (referred to as “batch processing” or “immersionprocessing”), or dispensing fluid on a wafer while spinning (referred toas “single wafer processing”). As wafer sizes increase and geometrysizes decrease, substantial benefits can be realized by employing singlewafer processing inasmuch as the processing environment may be bettercontrolled.

The etch rate of wet etch process will vary with changes in etchantconcentration. The addition of small amounts fresh chemical etchant tosustain the etch rate is a common practice when the chemical etchant isrecirculated. Typically the addition is based on a mathematical modelbased on wafers processed or elapsed time from etchant preparation. Ifthere is no measurement feedback the etch rate will hold only as well asthe mathematical model can predict the need to inject fresh chemicaletchant. Likewise any external influences will not be accounted for andthe etch rate will not remain constant. The depth of the etch process isa function of etch rate and time. Time is well controlled but the etchrate can vary based on several factors. Likewise the required depth toetch will vary as there will be within wafer thickness variation andwafer to wafer thickness variations. The foregoing impacts the abilityof existing wet-etching process systems to precisely etch wafers to thedesired thickness and uniformity and consistently in a productionenvironment. Accordingly the lack of a method to process wafersaccording to etch recipes that are accurately tailored to the amount ofmaterial to be removed from each wafer limits the capability of existingsystems to expose a precise depth on each wafer processed.

Similar to thinning TSV wafers, the conventional process for thinningnon TSV wafers involves grinding to remove the bulk of the wafer and amultistep sequence of processes that includes chemical mechanicalplanarization (CMP) and plasma etching to complete the final thinning ofthe wafer. However, this conventional process has a number ofdisadvantages associated therewith including but not limited to thecomplexity of the process and the associated costs. As describedhereinafter, the present invention is directed at overcoming thesedeficiencies associated with the conventional process by providing asimple, cost effective method to wet etch the remaining substrate to adesired thickness and surface uniformity. Thus, there exists a need fora system and method for: (1) determining quantity and pattern ofmaterial to be removed from the substrate; (2) removing the material tothe desired depth and uniformity efficiently in a productionenvironment. The present invention achieves these objectives asdescribed below.

SUMMARY

In one embodiment, the present invention is directed a method for wetetching a wafer using a wet etching processing system that includes aplurality of stations to produce a wafer having a desired final targetwafer thickness profile. As described herein, this method can employ adual etching step (two stage etching) in that the wafer is etched in atleast two discrete steps to achieve two different objectives.

One exemplary method includes the steps of: measuring, at a measurementstation, an initial thickness of the wafer; etching, at a first etchingstation, the surface of the wafer according to a first etch recipe andusing a first etchant to thin the wafer material and leave a layer ofresidual wafer material having a prescribed residual substrate materialthickness (RST) above the TSVs, wherein the first etch recipe is basedon the measured initial thickness; etching, at a second etching station,the surface of the wafer according to a second etch recipe using asecond etchant to thin the wafer material such that a respective portionof each of the TSVs having the prescribed reveal height extend from thesurface; and wherein the plurality of stations are disposed within ahousing and are accessed by an automated wafer transfer device that isconfigured to controllably move the wafer between stations, therebyallowing measurements of the wafer in real-time as the wafer isundergoing etch processing.

Another exemplary method includes the steps of: providing, at a processcontroller including a memory and a processor configured by executinginstructions in the form of code therein, a reference height for one ormore of the TSVs, the prescribed reveal height and a prescribed residualsubstrate material thickness (RST), wherein the prescribed RST is ameasure of the target thickness of the layer of residual wafer materialat each of the plurality of radial locations after a first etching step;measuring, at a measurement station, an initial thickness of the wafer;calculating, by the process controller, a respective first etch depthfor each of the plurality of radial locations, wherein the respectivefirst etch depth for a particular radial location is the amount ofmaterial to be removed at the particular radial location during thefirst etching step and is a function of the measured initial thicknessof the particular radial location, the reference height of one or moreof the TSVs and the prescribed RST, and wherein the respective firstetch depths are non-uniform; generating, with the process controller, afirst-etch recipe based on the calculated respective first etch depths,wherein the first etch recipe controls movement of a nozzle during thefirst etching step causing the nozzle to selectively dispense a firstetchant onto each of the plurality radial locations thereby thinning thewafer at each radial location the respective first etch depths; etching,at a first etching station, the surface of the wafer according to thefirst etch recipe and using the first etchant; etching, at a secondetching station, the surface of the wafer according to a second etchrecipe using a second etchant to thin the wafer material such that arespective portions of each of the TSVs having the prescribed revealheight extend from the surface; and wherein the plurality of stationsare disposed within a housing and are accessed by an automated wafertransfer device that is configured to controllably move the waferbetween stations, thereby allowing measurements of the wafer inreal-time as the wafer is undergoing etch processing.

According to another aspect, an exemplary method includes the steps of:providing, at a process controller including a memory and a processorconfigured by executing instructions in the form of code therein, waferprofile data including a prescribed etch offset and a target final waferthickness profile that defines a target final thickness parameter foreach of a plurality of radial locations on a surface of the wafer afterthe second etch step; measuring, at a measurement station, an initialthickness of the wafer at a plurality of points across the surface ofthe wafer; calculating, using the configured processor, a first etchprofile according to the etch offset, the target final wafer thicknessparameter of each radial location and the measured initial thickness ofeach radial location; generating, using the configured processor, anetch recipe for the first etch step according to the first etch profile;etching, at an etching station using a first etchant having a first etchrate, the wafer according to the first etch recipe; measuring, at themeasurement station, a post-etch thickness of the wafer at a pluralityof points across the wafer; determining, using the configured processor,that the post-etch thickness of the wafer matches the final waferthickness profile; etching, at an etching station using a second etchantand having a second etch rate, the wafer according to a second etchrecipe; and wherein the plurality of stations are disposed within ahousing and are accessed by an automated wafer transfer device that isconfigured to controllably move the wafer between stations, therebyallowing measurements of the wafer in real-time as the wafer isundergoing etch processing.

The present process, in at least one aspect, is thus directed to a wetetch process as a simple and cost-effective alternative to theCMP/plasma etch TSV reveal process.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a perspective view showing a system for performing a wetetching process in accordance with one embodiment disclosed herein;

FIG. 2 is a front plan view showing a system for performing a wetetching process in accordance with one embodiment disclosed herein;

FIG. 3 is a block diagram showing an exemplary configuration of a systemfor performing a wet etching process in accordance with one embodimentdisclosed herein;

FIG. 4 is a front plan view showing a measurement station in accordancewith one embodiment disclosed herein;

FIG. 5 is a perspective view showing a wet etching station in accordancewith one embodiment disclosed herein;

FIG. 6A is a front plan view showing a cleaning station in accordancewith one embodiment disclosed herein;

FIG. 6B is a front plan view showing a cleaning station in accordancewith one embodiment disclosed herein;

FIG. 7A is a block diagram showing an exemplary configuration of asystem for performing a wet etching process in accordance with oneembodiment disclosed herein;

FIG. 7B is a block diagram showing an exemplary configuration of aprocess control system in accordance with one embodiment disclosedherein;

FIG. 8A is a flow diagram showing a routine for performing a wet etchingprocess in accordance with at least one embodiment disclosed herein;

FIG. 8B is a flow diagram showing a routine for performing a wet etchingprocess in accordance with at least one embodiment disclosed herein;

FIG. 9A is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 9B is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 9C is a cross-section view showing an exemplary silicon substratehaving TSVs in accordance with one embodiment disclosed herein;

FIG. 9D is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 9E is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 9F is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 9G is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 9H is a cross-section view showing an exemplary silicon substratehaving TSVs in accordance with one embodiment disclosed herein;

FIG. 9I is a screenshot of a graphical user interface in accordance withat least one embodiment disclosed herein;

FIG. 10 shows AFM images of TSV wafer surface post grind (left) and post10-μm etch (right));

FIG. 11A is the TEM image of a wafer cross section close to the surface;

FIG. 11B is the TEM image of a ground wafer after the two step etchprocess;

FIG. 12 shows the actual measurement results on a TSV wafer (belowimage: in-line-measured pre- and post-etch TSV wafer thickness); and

FIG. 13 shows a fractured cross-section of a TSV that has been revealed.

FIG. 14A is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14B is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14C is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14D is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14E is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14F is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14G is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein;

FIG. 14H is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein; and

FIG. 14I is a screenshot of a graphical user interface in accordancewith at least one embodiment disclosed herein.

DETAILED DESCRIPTION OF CERTAIN EMBODIMENTS OF THE INVENTION

FIGS. 1-5 illustrate a system 100 for performing a wet etching processin accordance with one embodiment of the present invention. The system100 can thus be thought of as being a wet-etching facility formanufacturing semiconductor devices.

It will be appreciated that the teachings disclosed in the commonlyowned U.S. patent application serial numbers which have beenincorporated herein previously, can be implemented in the system 100.

In a wafer wet treatment process of a semiconductor device manufacturingprocess, there is generally an etching process and a cleaning process asmentioned hereinbefore. A single wafer wet treatment apparatus used inan etching process dispenses chemical etchant in a controlled manner ona substrate for inducing a chemical reaction during a fixed time. Itwill be understood that the terms “wafer” and “substrate” are usedinterchangeably herein. A single wafer wet treatment apparatus used in acleaning process causes a chemical solution to be dispensed onto asubstrate and can also include a scrubbing device to mechanically scrubthe substrate. Each of the wet treatment apparatuses can include a baththat collects fluids that overflow and discharge to an outer tank (orbath) or recirculate. The single wafer wet treatment apparatuses arefurther composed of conduits (e.g., pipes) which supply or dischargefluids (e.g., chemicals, water, solutions and the like) in the bath, andvarious kinds of control means for controlling fluid temperature orconcentration and other process parameters as further described herein.The wafer wet treatment process can also include a measuring stepwhereby the wafers are measured for thickness.

In conventional systems for performing wet etching, there are a numberof pieces of equipment that are used; however, there is generally a lackof integration between the pieces of equipment. More specifically, whilethe measurement step is performed at a first location, there is oftenthe need for physically transferring the wafer to another remote stationfor the etching process using a wafer wet etching apparatus, and thereis often a need for physically transferring the wafer to another remotestation prior to completion of the etching process, for example, toclean the wafer or measure the wafer. This adds additional delay to theprocess since there can be wait times before reintroducing the waferback to the wafer wet treatment apparatus. This conventional process islargely a manual process in which a technician manually moves the wafersbetween different pieces of equipment.

In direct contrast to the largely non-integrated conventional systems,the system 100 of the present invention is for the most part a largelyor fully integrated system, thereby greatly reducing or eliminatingunnecessary wait or down times, etc. between processing steps.

The system 100 is an integrated system that is defined by a number ofdifferent devices (equipment pieces) that are located at differentstations within a housing 110. As shown in FIG. 1, the housing 110 isgenerally in the form of an upstanding cabinet or the like that has aplurality of walls 112 that define a hollow interior 120. The hollowinterior 120 can be accessible through a number of different accesspoints, including but not limited to a door assembly 130 shown at oneend of the housing 110 and one or more side walls 112 can includewindows 140 to allow direct access and viewing of the hollow interior120 and more particularly, the equipment and processing stationsincluded therein. In one embodiment, as illustrated, one side wall 112can include transparent windows 140 and one or more access points 150.The opposite side walls 112 can include an access point 150 of adifferent form, such as a set of doors as shown in FIG. 2.

Each access point 150 can be in the form of an opening that provides anentrance into the hollow interior 120 and in addition, a wafer holdingand loading device (loadport) 160 can be provided at such location alongone side wall 112. The device 160 can be any number of conventionaldevices that are designed to hold and permit access to wafers containedtherein and can be in the form of a FOUP loadport, with FOUP being anacronym for Front Opening Unified Pod or Front Opening Universal Pod. AFOUP is a specialized plastic enclosure with a cassette therein designedto hold silicon wafers securely and safely in a controlled environment,and to allow the wafers to be removed for processing or measurement bytools equipped with appropriate loadports and robotic handling systems.As illustrated in FIG. 1, the device 160 can be in the form of aninput/output cassette device.

The wafer holding and loading device (loadport) 160 can be in the formof an input/output wafer cassette device which includes a housing whichis configured to receive and hold a cassette holding a plurality ofwafers. For example, the housing can include a door 162 at each endthereof, with one door 162 facing outwardly away from the hollowinterior 120 so as to allow a technician to load one or more wafers,into the loadport 160. Another door 162 faces and is accessible withinthe hollow interior 120 so as to permit automated removal (andreloading) of the wafer from within the hollow interior 120 to allow thewafer to be transferred to the various stations contained within thehollow interior 120. The wafer holding and loading device 160 can be ofthe type that includes a plurality of racks or the like for holding aplurality of wafers in a vertically stacked manner.

The housing (cabinet) 110 can also include one or more computerterminals 170 which operate in the manner described below and allow thetechnician to both control and monitor the processing of the waferwithin the housing 110 as the wafer is subjected to the variousprocessing steps at the different stations.

It will also be appreciated that the system 100 can include a number ofdifferent conventional operating systems to provide for power, cooling,heating, fluid flow (plumbing architecture), etc. The system 100 alsoincludes a number of different safety features including an emergencyoff button and audible and/or visual alarms to alert the technician whenan abnormal condition is observed within the system 100.

FIG. 3 is a schematic view showing exemplary stations that are containedwithin the housing (cabinet) of the system of the present invention. Ingeneral, the system 100 includes a first station 200 that contains oneor more devices 160 for holding wafers (e.g., FOUP loadports) andproviding direct access to the interior 120 of the housing 110 asdescribed above. A second station 210 is in the form of one or moremeasuring chambers for measuring different properties of the wafer asdescribed below. A third station 220 contains one or more etch chambersfor performing a single wafer wet-etching process on the wafer. A fourthstation 230 and optionally also a fifth station 240 are cleaningchambers in which the processed wafer is cleaned. As a result of thesystem 100 being an automated system, a wafer transfer device 300 isprovided and is configured to move one or more wafers from between thevarious stations of the system 100. The wafer transfer device 300 cantake any number of different forms but generally is in the form of anautomated device, such as a robot, that is configured to controllablygrasp, move and release one or more wafers. Generally, the wafertransfer device 300 includes a robotic arm that has a grasp (holding)mechanism for grasping and holding a wafer and has a base about whichthe robotic arm can move in multiple directions (multiple degrees offreedom). It should be understood that one or more of the processstations/chambers can be combined to have multiple process functions.For example, the measuring apparatuses used in the measuring chamber canbe incorporated into the wet etch chamber to provide a combinedmeasuring and etch station. By way of further example, the etch chamberand cleaning chamber can be combined into multi-process chambers aswould be understood by those skilled in the art.

Thus, the wafer transfer device 300 can thus be thought of as being anautomated wafer handler. It will also be appreciated that the wafertransfer device is a computer operated device and therefore, asdescribed below, operates in accordance with the execution of a softwareapplication, etc. In addition, it will also be appreciated that thewafer transfer device 300 can be operated in response to user generatedcommands, such as commands that are generated by the technician at auser interface, such as the computer terminal 170.

While in FIG. 3, the wafer transfer device 300 is shown as beingcentrally located within the interior of system 100, it is not limitedto assuming such a position within the system so long as the wafertransfer device 300 is located at a position that allows the device 300to access each of the stations of the system and transfer the waferbetween all of the necessary stations.

Each of the individual stations mentioned above is described in greaterdetail below.

First Station 200

As mentioned above, the first station 200 includes one more waferholding and loading devices (FOUP loadport or input/output cassettes)160 for holding wafers in a sealed and secure manner. Any number ofdifferent conventional wafer holding and loading devices (FOUP loadport)160 can be used in system 100. Typically, the wafer holding and loadingdevice (FOUP loadport) 160 is of a type that contains a cassette holdingthe wafers. The door 162 is positioned such that the wafer transferdevice (robot) 300 can directly access the wafers from the FOUP. Thewafer holding and loading device (FOUP loadport) 160 can also includerecognition features, such as RFID tag, barcode reader, etc. to allow itto be identified by readers on tools, etc. It should be understood thatloadport 160 is not limited to being of an FOUP type. Various waferholding and loading mechanisms can be used in addition to FOUPs havingbuilt in cassettes such as wafer boxes having removable cassettes aswould be understood by those skilled in the art.

While FIG. 3 shows two blocks as constituting the station 200, it willbe understood that this is only for illustrative purposes and is notlimiting of the present invention since, as shown in FIG. 1, system 100can include more than one wafer holding and loading device (FOUPloadport) 160. Moreover, it should be understood that each loadport 160can be configured to receive one or more cassettes.

Second Station 210

As mentioned above, the second station 210 is a measuring station (waferinspection station) in which a property of the wafer can be measured andin particular, the thickness of the wafer can be measured. The secondstation 210 thus includes a measuring device 600 for measuring one ormore properties of a wafer. Any number of different types of measuringdevices can be used. In accordance with one embodiment of the presentinvention, the measuring device 600 is in the form of an imaging devicethat is configured to measure one or more properties (e.g., waferthickness and surface profile) of the wafer.

FIG. 4 shows one exemplary measuring (imaging) device 600 that includesa platform 610 for receiving and holding a wafer in a fixed orientation(e.g., in a horizontal orientation). The platform 610 can be of anadjustable type to accommodate different sized wafers. For example, thediameters of wafers can vary considerably and thus, the platform 610 isconstructed to allow different sized wafers to be placed and supportedthereon. In addition, the platform 160 can move in any number ofdifferent directions (x, y, z) (i.e., the platform 610 has multipledegrees of freedom of movement) and is rotatable such that the wafer canbe rotated during the measuring process.

The imaging device 600 also includes a non-contact measurement component620 that measures at least the thickness of the wafer and is alsoconfigured to detect (measure) and generate a surface profile for thewafer. The non-contact measurement component 620 includes imagingequipment and can be part of an automated device to allow movement ofthe component 620 with respect to the wafer on the platform 610. Forexample, the non-contact measurement component 620 can be in the form ofan arm or the like that can move in any number of different directions(x, y, z) with respect to the wafer (i.e., the component 620 hasmultiple degrees of freedom of movement). Alternatively or in addition,the component 620 can be held in a stationary position and platform 610supporting the wafer can be moved in any number of different directions(x, y, z) with respect to the component 620 and/or rotated.

The non-contact measurement component 620 includes one or more sensors630, such as an optical sensor (e.g., an IR light sensor) and a lightsource that is directed at the surface of the wafer. The reflected light(after contacting the wafer) is collected by the imaging device andbased on the collected information (and after processing thereof inaccordance with execution of software), a number of differentmeasurements of the wafer can be taken and recorded. More particularly,light is reflected at the top and bottom of each surface in the filmstack (the layers of material that form the wafer) and the distance inreflected light is corrected according to the refractive index of thematerial in order to calculate depth. For example, the imaging devicecan measure the following properties (which is not an exhaustive list):wafer thickness; bow, warp, flatness; surface roughness; total thicknessvariation (TTV); optical inspection pattern recognition; and TSV depth,etc. One commercial source for one or more components of the imagingdevice is ISIS Sentronics gmbH, Germany; however, other commercialsources are available.

The operation of the imaging device 600 is described in greater detailhereinafter.

In accordance with one aspect of the present invention and in directcontrast to conventional systems, the measuring station 210 is directlyincorporated into and contained within the housing (cabinet) 110. As aresult, the second station 210 and the imaging device 600 containedthereat is within reach of the wafer transfer device (robot) 300. Thispositioning allows the automated wafer transfer device 300 to easilymove a wafer between the second station 210 and any of the otherstations of the system 100. This is in direct contrast to conventionalsystem in which measuring equipment is located at a remote location andrequires wafers to be removed from the etch process in order for ameasurement to be taken. After such measurement is taken, there is await period in which the wafer is held before being introduced back intothe etch processing equipment. This leads to complexity and time delays,thereby directly and adversely impacting the number of wafers that canprocessed in a given time period. Moreover, in a production setting,these inefficiencies lead to batch processing of wafers, whereinmultiple wafers are measured prior to being returned to the etchprocessing equipment. Accordingly any feedback regarding the etchingprocess is only obtainable on a batch to batch basis and not in realtime (i.e., on a wafer to wafer basis) thereby preventing the adjustmentof process parameters in real time (on a wafer to wafer basis) andresulting in a decrease in quality and an increase in waste.Incorporating the measuring device into system 100 and implementing aprocess that includes a measuring step for each wafer before and afteretching in a single wafer wet etch chamber as further described hereinprovides a system capable of tailoring the etch process parameters tothe specific characteristics of each wafer and feedback concerningpreviously etched wafers in real time. Accordingly the system canachieve higher quality, minimize waste and the benefits generallyassociated with a single wafer wet etch process and in the case of thepresent invention as described herein can be implemented as part of adual wet etch process which includes at least two etching steps.

Third Station 220

The third station 220 is an etch station in which the wafer undergoesthe single wafer wet etching process. As mentioned before, a singlewafer wet etching process is generally performed by dispensing a certainamount of chemical etchant onto a wafer disposed within the station, andcausing a chemical reaction with a contacted surface of the wafer sothat the unnecessary portion of the contacted surface is etched by thechemical.

As shown in FIG. 5, the third station 220 includes a single wafer wetetching apparatus 400 that includes an etch chamber (enclosure) 410 thatcontains the equipment and chemical etchant used in the wet etchingprocess. The etch chamber 410 can thus be thought of as a chemicalcontainment structure. It will be understood that third station can holda plurality of etching apparatus' 410, such as is a vertically stackedorientation, to allow wet etching to be performed simultaneously on morethan one wafer. The enclosure 410 also collects and contains thechemicals used in the etching process.

The wet etching apparatus 400 located at the third station 220 alsoincludes spin chuck 420 (variable speed controlled by an etch controller401 which is part of the overall process control system describedherein) on which the wafer rests, as well as an etch tool (arm) 430 thatincludes one or more nozzles (orifice) 435 that dispenses a fluid (e.g.,one or more liquids, preferably the chemical etchant). The etch tool 430can be in the form of an arm that is movable along multiple directions(x, y, z directions) and thus, has multiple degrees of freedom. The etchtool 430 is a controllable tool in that it is controlled by a computingdevice such as etch controller 401 and is part of the overallprogrammable computer system employed in the system 100 as describedherein. As a result, the etch tool 430 can be driven to any specificlocation of the wafer, etc.

The wet etching apparatus 400 also includes a fluid delivery and fluidremoval system for both introducing the etch chemicals and removing suchchemicals from the chamber. These components are implemented using aconventional fluid plumbing scheme in which conduits are provided forsupplying fluid (e.g., one or more liquids, preferably a chemicaletchant) to the nozzle 435. In addition, the wet etching apparatus 400includes conduits and mechanisms for discharging fluid(s) thataccumulate within the enclosure 410 during the wet etching process.

The mechanical chuck 420 permits the chuck 420 to hold the wafer. Thechuck 420 includes a main shaft (not shown) which can be joined to adriving shaft of a motor so as to allow the wafer held by the spin chuck420 to make a spin rotation about a Z-axis. A power source switch of themotor is connected to an output side of the etch controller 401, withthe result that the rotation speed of the motor is controlled by thecontroller 401. Also, the spin chuck 420 can be supported by a liftmechanism (not shown) so as to be movable in a direction of the Z-axis.

Traditionally, around the outer periphery and bottom portion of the spinchuck 420 a structure is provided for receiving and collecting theetchant solution, which is centrifugally separated from the wafer and isthen discharged to the outside. Part of the mechanism for dischargingfluid(s) from the enclosure 410 can be an exhaust gas passageway anddrain pipes that are formed in the bottom portions of the collectorstructure that surrounds the chuck 420. The liquid stored in thecollector structure can be discharged to the outside through one or moredrain pipes or re-circulated.

In accordance with the present invention, any number of suitable etchingsolutions can be used so long as they are suitable for a wet etchingprocess and for the intended substrate and application. Thus, differentchemistries can be used based on a number of different parameters,including in view of the properties of the wafer.

With respect to the delivery of the etchant solution, the wet etchingapparatus 400 also includes means for controlling the flow properties(flow rate) and temperature of the etchant solution. The operatingsystem can include one or more first flow rate control sections,including but not limited to a pump or valve, that extend from a liquidsupply source to a nozzle. The operating section of the flow ratecontrol section can be connected to the output side of the etchcontroller 401 so as to control the flow rate of the etchant solutionsupplied to the nozzle. In addition, other control mechanism can be usedto control the concentration of the etchant solution. The control of theconcentration of the etchant is one means for controlling the overalletch rate and etch process for a given wafer.

Fourth and Fifth Stations 230, 240

After the wafer undergoes processing at the etch station 220, the waferis then cleaned at one or more wafer cleaning stations. FIG. 3 shows twodistinct cleaning stations 230, 240; however, this is merelyrepresentative of one embodiment and it will be appreciated that asingle cleaning station can be used. In such a construction, the singlecleaning station can still employ one or more different cleaningtechniques for cleaning the wafer.

As shown in FIG. 6A, the cleaning station 230 can be of a wafer cleaningapparatus 1600 (of the scrubbing or brush box type) in which the waferis scrubbed while a cleaning solution is dispensed on the wafer toremove larger residual particles and etch residue. More specifically,the wafer cleaning apparatus 1600 can include a chamber (enclosure) 1610that contains the equipment and contains the injected cleaning solutionused in the cleaning process. The chamber thus at least partially is asealed environment and can include a wafer scrubbing device 1615 whichcomprises a chuck 1620 (e.g., spin, rotating chuck) for supporting awafer to be cleaned. The wafer scrubbing device also comprises a brushmechanism which includes one or more brushes 1630 for scrubbing thewafer. The brush mechanism also includes a drive mechanism 1640 forrotating the brushes, a clamping mechanism for clamping and unclampingthe brushes, and a motor for driving the brushes, according to one ormore controlled directions (e.g., radially) across the surfaces of thewafer.

During an exemplary scrubbing process, it is desirable to direct streamsof water or streams of a cleaning solution at both surfaces of thespinning wafer to wash away particulates. This is typically accomplishedby providing spray nozzles 1650 positioned above and/or below the wafer.The spray nozzles are preferably connected to a source of pure water orcleaning solution through supply pipes. The flow rate of the water orcleaning solution can be controlled by a pump and valve arrangement (notshown) which is, in turn, controlled by a cleaning controller 1601(which is part of the overall process control system described herein).Alternatively, a pressurized fluid source can be used to provide fluidflow.

The cleaning station 240 can be a physically different station that islocated proximate to the cleaning station 230 and is of a type in whichthe wafer is subjected to a different cleaning process than the oneemployed in the cleaning station 230. The cleaning station 240 can bethought of as being a final clean station. As mentioned above, the firstcleaning step involves a scrubbing process which primarily removes thelarger particles and residual etchant. The wafer can be transferred wetfrom the first cleaning station 230 to the final cleaning station 240.

As shown in FIG. 6B, similar to cleaning station 230, the final cleaningapparatus 1700 can be in the form of a chamber 1710 and includes one ormore arms 1740 and nozzles 1750 to dispense a high velocity spray ontothe wafer and/or use a megasonic cleaning apparatus 1780 for the removalof small particles from the wafer surface. In addition, station 240 caninclude a drying apparatus 1790 to dry the wafer at the end of the finalcleaning process.

The Wet Etch Process Using System 100

FIG. 7A is a high-level diagram illustrating an exemplary configurationa process control system 700 for use with the system 100 for performinga wet etching process. In contrast to previous design, the presentinvention utilizes at least in some embodiments, a multi-step wet etchprocess as described herein. In one arrangement, the process controlsystem consists of one or more computing devices including a processcontroller 705. It should be understood that process controller 705 canbe practically any computing device and/or data processing apparatuscapable of embodying the systems and/or methods described herein.

Process controller 705 can be configured to communicate with the variouscomputer-controlled components of the system 100, including firststation 200, second station 210, third station 220, fourth station 230,fifth station 240, and the computer controlled devices or controllersassociated therewith including but not limited to wafer transfer device300, FOUP loadports 160, imaging device 600, etch controller 401 andcleaning controller 1601 transmitting electronic information to andreceiving electronic information from the various components.

It should be noted that while FIG. 7A depicts the process control system700 with respect to a process controller 705, it should be understoodthat any number of process controllers can interact with the processcontrol system 700 and the constituent computer controlled components ofsystem 100 in the manner described herein. It should be furtherunderstood that while the various computing devices and machinesreferenced herein, including but not limited to computer terminal 170,process controller 705, first station 200, second station 210, thirdstation 220, fourth station 230, fifth station 240, and the computercontrolled devices or controllers associated therewith including but notlimited to wafer transfer device 300, FOUP loadports 160, imaging device600, etch controller 401 and cleaning controller 1601 are referred toherein as individual/single devices and/or machines, in certainimplementations the referenced devices and machines, and theirassociated and/or accompanying operations, features, and/orfunctionalities can be arranged or otherwise employed across any numberof devices and/or machines, such as over a direct connection or networkconnection, as is known to those of skill in the art.

FIG. 7B is a block diagram illustrating an exemplary configuration ofprocess controller 705 of the system 100 for performing a wet etchingprocess. Process controller includes various hardware and softwarecomponents that serve to enable operation of the system, including aprocessor 710, memory 720, display 740, storage 790 and a communicationinterface 750. Processor 710 serves to execute software instructionsthat can be loaded into memory 720. Processor 710 can be a number ofprocessors, a multi-processor core, or some other type of processor,depending on the particular implementation.

Preferably, memory 720 and/or storage 790 are accessible by processor710, thereby enabling processor to receive and execute instructionsstored on memory and/or on storage. Memory can be, for example, a randomaccess memory (RAM) or any other suitable volatile or non-volatilecomputer readable storage medium. In addition, memory can be fixed orremovable. Storage 790 can take various forms, depending on theparticular implementation. For example, storage can contain one or morecomponents or devices such as a hard drive, a flash memory, a rewritableoptical disk, a rewritable magnetic tape, or some combination of theabove. Storage also can be fixed or removable.

One or more software modules 730 are encoded in storage 790 and/or inmemory 720. The software modules can comprise one or more softwareprograms or applications having computer program code or a set ofinstructions executed in processor 710. Such computer program code orinstructions for carrying out operations for aspects of the systems andmethods disclosed herein and can be written in any combination of one ormore programming languages. The program code can execute entirely onprocess controller 705, as a stand-alone software package, partly onprocess controller, or entirely on another computing/device or partly onanother remote computing/device. In the latter scenario, the remotecomputing device can be connected to process controller through any typeof direct electronic connection or network, including a local areanetwork (LAN) or a wide area network (WAN), or the connection can bemade to an external computer (for example, through the Internet using anInternet Service Provider).

Preferably, included among the software modules 730 is a measuringmodule 770, a wafer profile module 772, an etch recipe module 774, anetching process module 776, and a database module 778 and a userinterface module 780 that are executed by processor 710. Duringexecution of the software modules 730, the processor configures theprocess controller 705 to perform various operations relating to thesystem 100 for performing a wet etching process, as will be described ingreater detail below.

It can also be said that the program code of software modules 730 andone or more computer readable storage devices (such as memory 720 and/orstorage 790) form a computer program product that can be manufacturedand/or distributed in accordance with the present invention, as is knownto those of ordinary skill in the art.

It should be understood that in some illustrative embodiments, one ormore of software modules 730 can be downloaded over a network to storage790 from another device or system via communication interface 750 foruse within the system 100. In addition, it should be noted that otherinformation and/or data relevant to the operation of the present systemsand methods (such as database 785) can also be stored on storage, aswill be discussed in greater detail below.

Also preferably stored on storage 790 is database 785. As will bedescribed in greater detail below, database contains and/or maintainsvarious data items and elements that are utilized throughout the variousoperations of the system 100. The information stored in database caninclude but is not limited to, parameter adjustment algorithms, recipes,chemical mixture details, set-points, settings, alarms, actual valuesfor process variables, and historical data collected and analyzed by theprocess controller (e.g., batch records, substrate thickness measurementinformation, via depth measurement information) as will be described ingreater detail herein. It should be noted that although database isdepicted as being configured locally to process controller 705, incertain implementations database and/or various of the data elementsstored therein can be located remotely (such as on a remote computingdevice or server—not shown) and connected to process controller througha network or in a manner known to those of ordinary skill in the art.

An interface 715 is also operatively connected to the processor 710. Theinterface can be one or more input device(s) such as switch(es),button(s), key(s), a touch-screen, microphone, etc. as would beunderstood in the art of electronic computing devices. Interface servesto facilitate the capture of commands from the user such as on-offcommands or settings related to operation of the system 100.

Display 740 is also operatively connected to processor 710. Displayincludes a screen or any other such presentation device which enablesthe user to view information relating to operation of the system 100including control settings, command prompts and data collected byvarious components of the system 100 and provided to process controller.By way of example, display can be a digital display such as a dot matrixdisplay or other 2-dimensional display.

By way of further example, interface and display can be integrated intoa touch screen display. Accordingly, the screen is used to show agraphical user interface, which can display various data and provide“forms” that include fields that allow for the entry of information bythe user. Touching the touch screen at locations corresponding to thedisplay of a graphical user interface allows the person to interact withthe device to enter data, change settings, control functions, etc. So,when the touch screen is touched, interface communicates this change toprocessor, and settings can be changed or user entered information canbe captured and stored in the memory.

Audio output 760 is also operatively connected to the processor 710.Audio output can be any type of speaker system that is configured toplay electronic audio files or generate audio tones as would beunderstood by those of ordinary skill in the art. Audio output can beintegrated to the process controller 705 or external to the processcontroller 705.

Communication interface 750 is also operatively connected to theprocessor 710 and can be any interface that enables communicationbetween the process controller 705 and external devices, machines and/orelements including [robot, imaging device, etch controller, cleancontroller, chemistry controller]. Preferably, communication interfaceincludes, but is not limited to, Ethernet, IEEE 1394, parallel, PS/2,Serial, USB, VGA, DVI, SCSI, HDMI, a Network Interface Card (NIC), anintegrated network interface, a radio frequency transmitter/receiver(e.g., Bluetooth, cellular, NFC), a satellite communicationtransmitter/receiver, an infrared port, and/or any other such interfacesfor connecting process controller 705 to other computing devices and/orcommunication networks such as private networks and the Internet. Suchconnections can include a wired connection (e.g. using the RS232standard) or a wireless connection (e.g. using the 802.11 standard)though it should be understood that communication interface can bepractically any interface that enables communication to/from the processcontroller 705.

At various points during the operation of the system 100 for performinga wet etching process, process controller 705 can communicate with oneor more computing devices, for instance, computing devices used tooperate the various process stations and constituent devices as will befurther described in greater detail herein. Such computing devices cantransmit and/or receive data to/from process controller 705 and betweenone another, thereby preferably initiating maintaining, and/or enhancingthe operation of the system 100, as will be described in greater detailbelow.

The operation of the system 100 for performing a wet etching process andthe various elements and components described above will be furtherappreciated with reference to the process for exposing TSVs as describedbelow, in conjunction with FIGS. 7, 8, 9A-9I and 10, 11.

FIG. 8 is a flowchart illustrating a process flow 800 for etching wafersusing system 100 in accordance with an embodiment of the invention. Itshould be understood that the exemplary process can be performed on postgrind TSV substrates (i.e., wafers) in which the TSVs are not exposed onthe top surface of the wafer due to a layer of residual substratematerial (also referred to as overburden). Moreover, the bottom surfaceof the wafer is mounted to a carrier with an adhesive layer that canvary in thickness from one wafer to another. However, it should beunderstood that wafers are not limited to this particular carrierconfiguration as the exemplary process is operable on wafers inalternative carrier configurations and non-carrier configurations aswould be understood by those skilled in the art. The exemplary processprovides specialized metrology to determine the thickness of theoverburden and wet etch wafers in multiple stages using the system 100to expose the TSVs to a desired depth and wafer thickness uniformity. Asdescribed herein, the present system can employ two or more discrete wetetching stages (steps) that are performed in the same or differentwet-etching stations in the system for performing a wet etching process100 to expose the TSVs to the desired depth.

As further described herein, the system 100 is configured to measure thewafer thickness, calculate a residual substrate material thickness RSTat respective radial locations (as defined herein) (e.g., the thicknessof the overburden above the top of the TSVs) generate one or more etchrecipes and, through multiple etching steps, selectively etch the waferto minimize any radially dependent non-uniformities in RST and revealthe TSVs to a prescribed reveal height and tolerance. Two very differentchemistries can be chosen for the specific attributes that each offersand the target of each etch step. In one exemplary implementation, thefirst etch step can be performed to eliminate the non-uniformities inRST thickness that result from TSV formation and the non-uniformity ofthe wafer thickness from the grinding step. The required etch time andetch profile will therefore be different for each wafer and benon-uniform in profile. This highly targeted non-uniform etch can beaccomplished through the use of an isotropic etchant. The chemistryselected (e.g., HF:HNO3 with viscosity agents, strong acid) is anon-selective silicon etchant that is very responsive to the locationthat it is dispensed onto by the nozzle with a high etch rate. In otherwords, dispensing etchant onto a particular radial location willconcentrate (i.e., localize) the etching to the particular radiallocation that the stream of etchant is dispensed onto. Accordingly, thisyields the ability to quickly and accurately sculpt the wafer to thetarget first wafer profile, in other words, thinning the non-uniformoverburden layer and leaving a thin but uniform layer of substratematerial remaining above the TSVs. If no substrate layer remained abovethe TSVs, this etchant could attack the oxide liner and conductive viamaterials and ruin the wafer.

In some implementations, another task accomplished during the first etchis a smoothing of the wafer surface. Again the properties of the etchantpermit the incoming rough wafer surface to be smoothed during this etch.As the surface can be sufficiently smoothed by the first etching stage,the exemplary process can eliminate the need for a polishing CMP(Chemical Mechanical Planarization) step prior to the etch step. Thisreduces the cost of the process by eliminating another manufacturingstep in the etching process.

The second etch (i.e. “reveal etch”) in contrast is a methodic,anisotropic and repeatable process. This can be performed using a highlyalkaline etchant. The etchant is preferably selective to etch thesilicon and not the TSV or liner materials. The second etch removes thesmall amount of substrate material that remained to protect the TSVmaterials and continues to etch so that the TSVs become exposed to aprescribed reveal height. The second etch can have very little impact onthe smoothness of the remaining silicon and no significant impact (or noimpact) on the TSV materials (e.g., the liner or the conductive materialfilled in the via). Since the first etch step corrected thenon-uniformities in the wafer thickness, the second etch can beconfigured such that it is essentially uniform and repeatable across abatch of wafers and selective.

Although process flow is generally discussed in relation to TSV wafers,it should be understood that the exemplary process can be performed onnon-TSV wafers and provides specialized metrology to determine thethickness of the wafer and wet etch non-TSV wafers using system 100 to adesired final thickness and wafer thickness uniformity. As furtherdescribed herein, process 800 measures the thickness of a wafer beforeand after various stages in the wet etching process to dynamicallyadjust the etching of the wafer in subsequent etch steps to moreprecisely obtain the desired final wafer profile. In addition thethickness measurements of previous wafers can be analyzed so as todynamically adjust the processing parameters implemented for etchingsubsequent wafers in the batch accordingly. In addition oralternatively, the remaining wafers can undergo one or more of themeasuring and etching steps described in routine 800 so as to processone or more of the wafers in view of their respective measurementsindicating respective etching results.

In process block 805, the system 100 places the wafer into the waferthickness measurement station. In process block 810, the system measuresthe initial thickness of a wafer and calculates the required etch depthfor the wafer (the first etch profile) in accordance with the thicknessmeasurements and wafer profile. The wafer profile includes parametersthat define a first set of target physical characteristics of the waferafter the first etching stage (first target wafer profile) and a finalset of target physical characteristics after the secondary etching stage(final target wafer profile). In process block 815, the system generatesa first etch recipe for the wafer to achieve the first target waferprofile for the wafer after the first etch step (the first etching stageis referred to herein as “Spin-D”). In process block 820, the systemetches the wafer according to the first etch recipe. In process block825, the system 100 places the wafer into the wafer thicknessmeasurement station. In process block 830, the system re-measures thethickness of the processed wafer. In addition the measurement stationprovides the thickness measurements to the process controller to analyzethe actual physical properties of the wafer and calculate the requiredetch depth for the wafer in accordance with the desired physicalcharacteristics of the wafer after the second etching step (referred toherein as “Etch-1”). In process block 835, the system generates a secondetch recipe for the wafer to achieve a second etch profile and, as aresult, the final target wafer profile after the second etch step(referred to herein as “Etch-1”). In process block 840, the systemetches the wafer according to the second etch recipe. In someimplementations thickness measurements after the Spin-D and Etch-1etching step can be used to evaluate the efficacy of the respective etchrecipes and adjust the etch recipe for subsequent wafers being putthrough process flow 800 accordingly. In some implementations, thepost-etch thickness measurements can be used to re-calculate thepreceding etch recipe and re-run the preceding etch step one or moretimes until the respective target wafer profile is achieved.

By combining silicon thickness measurement, wet etch, and cleaning in asingle-wafer process system, the system described herein provides a lowcost-of-ownership for TSV reveal.

As would be understood by those in the art and further described herein,a wafer profile refers to the physical properties of a wafer at aplurality of locations or areas on the surface of the wafer (e.g., asmeasured at specific points or areas referred to as radial locations).An “initial” profile of a wafer is intended to refer to the actualphysical properties of the wafer at a plurality of locations on thesurface of the wafer. A “target” or “desired” wafer profile is theintended physical properties of the wafer after one or more etchingsteps. Accordingly, it can be appreciated that an etch profilerepresents the difference between the initial wafer profile and thetarget wafer profile after one or more etching steps and, as would beunderstood by those in the art, represents the physical properties ofthe wafer material (e.g., thickness at one or more of a plurality oflocations) that are intended to be etched away by one or more etchingsteps. In general, the physical characteristics for a wafer or etchprofile generally relate the thickness of the wafer. In someimplementations, a wafer profile can be expressed in terms of the totalthickness of the wafer material (e.g., thickness from a surface of thewafer mounted to a carrier and to the surface to be etched). However, itcan be appreciated that wafer thickness, or the amount of material to beremoved by etching, can be expressed in terms of other parameters. Forinstance, in regard to TSV substrates, thickness can be defined relativeto a reference height of the TSVs (e.g., the RST of the overburden abovethe top of the TSVs) or the target “reveal height” of the TSVs afteretching.

The two stage etching process allows for varying degrees of etchingprecision and, using in-line measurement, adjustments to the first andsecond etching recipes can be made to achieve optimized results andefficiency. For example, the first etch stage can be a preliminary etchor “rough etch” to efficiently reduce the thickness of the overburden,minimize radial dependent non-uniformities in wafer thickness and, insome cases, partially expose the TSVs, preferably, without over exposingthe TSVs. The second etching step can be run according to a more preciseand more controlled etch recipe to achieve the final target waferprofile upon completion of process 800 (the final wafer profile). Inaddition if the post Spin-D and/or Etch-1 wafer does not meet the finalwafer profile, the system can repeat process steps 825-840 until therespective target wafer profile is achieved.

In other words, the first etch stage can be used to effectively and withspeed, etch the wafer overburden and at a select point, the first stageis stopped and the second etch stage begins. Variations in the depth ofthe silica overburden can occur due to non-uniformities in post-grindthickness, via depth/height and bonding. Integration of wafer thicknessmeasurements before and after etching—within the single-waferequipment—provides the high-accuracy process control needed forhigh-volume manufacturing. Improvement in surface roughness and etchuniformity are achieved with this wet process through the combination ofchemistry performance and process optimization.

The specific steps followed in process 800 will be described in furtherdetail in conjunction with FIGS. 8B, 9A-9I. It should be appreciatedthat more or fewer operations can be performed than shown in the figuresand described herein. These operations can also be performed in adifferent order than those described herein, combined into multi stepprocesses or broken into sub-routines. The steps are described in thecontext of system 100 however practice of the steps is not limited tothe exemplary configuration of system 100 as described in FIGS. 1-7.

Before processing the wafer, a user can be prompted to create a “WaferProfile.” The wafer profile includes information about the desiredprofile of the wafer after each of the etching processes and specifiesvarious processing parameters for the measuring and etching steps thatare performed by the system 100. The wafer profile can be input by theuser using the user interface and received by the processor 710 of theprocess controller 705, which is configured by executing one or moresoftware modules 730, including, preferably the user interface module780 and the wafer profile module 772. FIG. 9A depicts an exemplarygraphical user interface (GUI) 910 for displaying the wafer profile 900by the display 740. The GUI includes interactive forms that can beedited by the user to adjust the wafer profile 900 using the userinterface 715.

As shown the wafer profile can include the following information:

-   -   Profile Name    -   1^(st) Etch Rate, 912    -   2^(nd) Etch Rate, 914    -   Minimum Reveal Tolerance, 916    -   Uniform Thickness Tolerance, 918    -   Wafer Measurement Type: Radius or Diameter, 920    -   Degrees: measurement theta rotation from wafer notch, 922    -   Wafer radius or diameter, 924    -   Steps: Number of measurements to be taken across the radius or        diameter of the wafer, 926    -   Center region of wafer: measurement area on wafer which is used        to determine Center Heavy, Center Light, or Uniform thickness.        928    -   Via Height 930, Reveal Depth 932, and Etch Offset 934, for each        measured point along the radius/diameter of the wafer 936.

As noted above, the first step in the exemplary process is a measuringstep to determine the physical properties of the wafer, namely thethickness of the wafer prior to etching. Because the measuring device isconfigured to measure the actual thickness of the wafer over the surfaceby optically scanning the wafer, the measurement resolution (e.g., thenumber of data-points collected over the wafer surface) can be adjusteddepending on the level of detail required by the application of theprocessed wafer, and can range from a detailed scan of the entiresurface to just a few data points over the surface. As shown in theexemplary GUI depicted in FIG. 9A, various measuring parameters can beinput or adjusted by the user using the user interface, including: thesize of the wafer 924, the number of scan steps between the start pointand end point of the wafer scan 926 (e.g., scan resolution defining thedistance between measurements) and the angle across the wafer that thethickness measurements are taken along 922. In addition the user canspecify the measurement type 920 which instructs the measuring device tomeasure across a radius of the wafer or across a diameter of the wafer.

The wafer profile 900 can also include information about the wafer'sphysical characteristics, including the TSV height 930 (also referred toas via height). The reference height of the TSVs in the wafer can beobtained from the manufacturer of the wafer and input manually by theuser or automatically collected and entered into the wafer profile bythe processor from a database storing such information. Alternatively,or in addition, the reference height can also be a function ofmeasurements of the actual height of the TSVs of one or more etchedwafers and automatically collected and entered into the wafer profile bythe processor from a database storing such information. The waferprofile defined by the user can also define the size (e.g., diameter) ofthe “center region” of the wafer.

The wafer profile 900 can also include information about the desiredphysical characteristics of the wafer after processing the wafer. Thedesired physical characteristics can be defined for each etch step aswell as the final wafer profile that is desired. The physicalcharacteristics can include: Minimum Reveal Tolerance 916 and UniformThickness Tolerances 918 and, for each incremental step of the scan, theReveal Depth 932, and the Etch Offset 934. Reveal depth is the finaltarget thickness of the wafer after the etching process is complete.Etch Offset can be used to define the amount of wafer material that isto be removed in the first etching stage (e.g., “Spin-D”). For example,when etching a TSV substrate as further described herein, the etchoffset can be expressed in terms of the amount of residual substratematerial above the TSVs after the first etch (e.g., 4 micrometersrelative to the top of the TSVs at respective radial locations). By wayof further example, etch offset can be expressed relative to the finalsubstrate thickness (e.g., 8 micrometers from the reveal depth). Thereveal height, which corresponds to the reveal depth and is alsorelative to the TSV height, specifies the desired height of the exposedportion of the TSVs at respective radial locations after processing. TheMinimum Reveal tolerance 916 is the maximum tolerated deviation betweenreveal height across the wafer, and the Uniform Thickness Tolerance 918concerns the difference between the minimum and maximum thickness of thewafer material after processing (e.g., the deviation of the reveal depthat respective radial locations). These and other such thicknesstolerances can be specified by the user when defining the wafer profile900. In addition, as shown in FIG. 9A, the GUI displaying the waferprofile 900 can also include a graphical representation 940 of variousparameters defined in the wafer profile. In particular, in FIG. 9A,which displays the wafer profile for a 180 mm wafer measured across adiameter, the graph 940 depicts a line 942 which corresponds to thereference via height 930 and a line 944 which corresponds to the revealdepth 932. As shown, the value for respective parameters are graphed asa function of distance from wafer center. The graph also depicts an areathat corresponds to the defined center region 946. FIG. 9B depicts analternative representation of an exemplary wafer profile 950 for a 180mm wafer measured across a radius. Accordingly the graphicalrepresentation 952 of the line corresponding to the TSV height 954 andthe reveal depth 956 is represented in radius format.

FIG. 8B shows a routine 850 for processing a wafer in greater detail. Atstep 855, the processor 710, which is configured by executing one ormore software modules 730, including, preferably, the measuring module770 and the wafer profile module 772 and the database module 778,initializes the wafer measurement process. This can include loading thewafer profile from memory to identify the wafer profile to be achievedby each ensuing etch step (e.g., Spin-D and, at later stages, Etch-1)and measure the wafer thickness in view of the desired wafer profile.Accordingly, it can be appreciated that the particular etch step andcorresponding parameters set forth in the wafer profile guides themeasurement process and the calculation of thickness and calculation ofvarious processing parameters by the configured processor.

Then at step 860 the system measures the wafer thickness prior to theSpin-D etch step. In particular, the processor 710, which is configuredby executing one or more software modules 730 including, preferably themeasurement module 770 and the database module 778, causes the imagingdevice 600 to collect thickness information for a wafer and record themeasurements to storage 790 or memory 720 for further processing by theprocessor.

Various methods for optically scanning the wafer can be implemented todetermine the thickness of the wafer and calculate thickness-relatedparameters concerning the various etching steps. The thicknessinformation can include: the wafer's radial thickness at various radii;total thickness variation (TTV, which represents the difference betweenthe minimum and maximum thickness measured on the wafer); wafer flatness(e.g., wafer bow); surface roughness and other measurements about thetopography of a wafer as would be understood by those skilled in the artand are suitable for use in the present invention. Preferably, imagingdevice 600 scans a representative sample of the surface of the wafer andcollects thickness information, including preferably, the waferthickness over the representative sample and provides the thicknessinformation to the processor 710 of the process controller 705.

Thickness measurements can be collected at various radial locations on awafer. In some implementations, the measurements can be used tocalculate an average thickness at each radial location as well as anaverage thickness of the entire wafer. In the parlance of the subjectdisclosure, “radius” or “radial” relates to a distance from the centerof the wafer. It should be understand that “radial location,” asdescribed herein, is an area on the surface of the wafer that surroundscenter at a given radius (e.g., radius=20 mm) or range of radialdistances from center (e.g., radius=20 mm-30 mm). One of skill in theart would readily recognize that due to the fact that the wafer isspinning during the etch processes, a radial location is manifested inthe form of an annular region (e.g., a ring surrounding the center)defined on the wafer at a prescribed radial distance or distances fromthe center of the wafer. Similarly, as further described herein, radialthickness refers to the thickness of a wafer at a given radial location(e.g., the thickness of the wafer measured at one or more points thatfall within the radial location).

Radial thickness can be calculated according to an algorithm that is afunction of the measured thickness of the wafer at a given radius fromthe center of the wafer. In addition, radial thickness can be an averageof plural thickness measurements at a radial location. In addition,thickness measurements collected at various radial locations on asubstrate, can be used to interpolate the thickness at intermediatelocations as a function of the distance between the two data points andthe respective thickness at the points. In other words, the configuredprocessor can perform an interpolation operation for generating suchintermediate measurements. By way of further example, a thicknessmeasured at a particular scan point can be interpreted to reflect thegeneral thickness of the substrate around the entire radial location.The beginning wafer thickness can also be calculated according to analgorithm that is a function of the measured average thickness of thewafer at a given radius of the wafer. For example, the beginning waferthickness can be represented by the following equation:BeginningWaferThickness=average(Measured Wafer Thickness)

Then at step 865 the system calculates, for each measured point on thewafer, various parameters based on the thickness of the wafer and thedesired wafer profile after the ensuing etch process. In someimplementations, prior to the Spin-D etch step, the processor 705, whichis configured by executing one or more of software modules 730,including, preferably the measuring module 770 and the wafer profilemodule 772, calculates the various thickness parameters in view of theparticular stage in the etching process and corresponding processingparameters set forth in the wafer profile.

In some implementations, prior to the first etching stage (referred toherein as “Spin-D”) the configured processor can determine the ResidualSubstrate Thickness (RST) for each scan point, wherein the RST is theamount of substrate material above the TSVs. The RST at each scan pointcan be partially or entirely removed during the Spin-D etch process. Forexample, the Spin-D etch can be defined to remove the bulk of thematerial above the TSVs and a prescribed amount of additional substratematerial (e.g., as defined by the Etch Offset in the wafer profile) fromthe wafer without completely revealing the TSVs to the final targetreveal height. Alternatively, the etch offset can be defined such thatthe Spin-D etch stage only removes a certain amount of material abovethe TSVs without exposing the TSVs and leaves a layer of residualsubstrate material having the thickness specified by the etch offset ateach of the radial locations. Accordingly, the RST can be calculated atvarious points across the wafer, and a corresponding etch depth can alsobe calculated to determine the amount of material to be removed by theSpin-D etch step based on the measured thickness, the TSV height and theetch offset. The following are exemplary equations for calculating RSTand Etch Depth at a particular radial location(x):RST[x]=MeasuredSi[x]−ViaHeight[x]Etch Depth[x]=MeasuredSi[x]−ViaHeight[x]−EtchOffset[x]

As noted above, etch depth is the desired amount of wafer material to beremoved from the surface at each of the radial locations in one or moreof the ensuing etch step. Accordingly, the etch depth for the variousradial locations of the wafer can be referred to as the etch profile. Asnoted above, the method of determining etch depth and the etch profilecan vary depending on the stage in the etching process and the targetwafer profile after the particular etch step. For example, as furtherdescribed herein, the etch profile for the Etch-1 step (e.g., secondetch profile) can be calculated based on the post-Spin-D waferthicknesses and the target final wafer profile. The second etch step canthus be thought of as a selective step that is used reveal the TSV tothe desired height in contrast to the first etch step, which isprimarily directed to reducing the overburden and minimizing radiallydependent non-uniformities in thickness (e.g., non-uniformities inthickness between various radial locations or non-uniformities in RSTacross the radial locations) without revealing the TSVs. However, asmentioned previously, the Spin-D etch step can, in some implementationsreveal a portion of the TSVs.

FIG. 9C depicts a cross section of a portion of an exemplary post grindTSV wafer 960 prior to the Spin-D etch process. Also depicted is thedesired etch depth of the Spin-D etch step as well as the total/finaletch depth 964 after the process is complete (e.g., after one or moresubsequent Spin-D or Etch-1 steps). As shown, the wafer includes a topsurface 966, a bottom surface 968 that is mounted to a carrier 970 by anadhesive layer 972 and TSVs 974 spaced throughout the wafer 960. Alsodepicted is the TSV height 963, the reveal height 965, the measuredthickness 967 and the reveal depth 969 for the wafer. As notedpreviously, the grinding process leaves a layer of overburden (e.g.,wafer material above the TSVs) that could vary in thickness (e.g.,within wafer thickness variations such as: thicker at the edge, uniformacross the wafer or thicker at the center of the wafer than at theedge,). Likewise, there can be a difference in height of the wafermaterial above the TSVs on a wafer to wafer basis (wafer to waferthickness variation). These differences in the layer above the TSVs canbe greater than the allowable difference in height of the exposed TSVs.In addition, the adhesive layer can also vary in thickness anduniformity, rendering exterior measurements ineffective at determiningthe thickness and uniformity of the material remaining in the topsilicon wafer, above the end of the via.

The processor 710 executing one or more software modules 730 including,preferably the measurement module 770, the wafer profile module 772, andthe user interface module 780, can be configured to output informationconcerning the wafer measurements and calculated thicknesses related toensuing etching steps to an operator/user via the display 740 in avariety of graphical formats. For example, FIG. 9D depicts a graph 975of the initial wafer thickness measurements compared to the waferprofile prior to the Spin-D processing step. As shown, the graph 970depicts the center region 976, a line corresponding to the TSV height977, and a line corresponding to the reveal depth 978 (e.g., finalreveal depth), a line corresponding to the TSV height plus the etchoffset 979 (e.g., the target wafer thickness at each radial locationafter the first etch step) and a line corresponding to the measuredthickness 980 across the diameter of the wafer. FIG. 9E depicts a GUIdisplaying the information depicted in FIG. 9D in a table 981. FIG. 9Fdepicts a GUI showing a graphical representation of the circular wafersurface 982 and the measurement locations 983 across a diameter of thewafer. FIG. 9G depicts a GUI displaying a chart 985 depicting the etchprofile 986 (e.g., the etch depth at each measurement location) acrossthe diameter of the wafer for the Spin-D etching stage.

In general, the etch profile includes etch depth as determined above.Etch profile can also define other changes that need to be made to theparticular substrate to achieve the desired physical characteristicsincluding but not limited to surface uniformity. Accordingly, etchprofile is a function of application dependent physical characteristicsof the processed wafer, by example and without limitation, desired TSVreveal height, desired substrate thickness, roughness and also afunction of actual physical characteristics of the particular substrateincluding via height and wafer thickness. For example, as shown in FIG.9G, the intended etch depth for the wafer during the Spin-D etching stepis greater at the edges of the wafer than the center. Accordingly, itcan be appreciated that the wafer can be characterized as “edge heavy”because there is a thicker layer of overburden above the top of the TSVstoward the edges of the wafer than the center region of the wafer.

In addition, at step 870, the processor 710 executing one or moresoftware modules 730, including preferably the wafer profile module 772,and the etch recipe module 774, can configure process controller 705 togenerate an etch recipe for the wafer that can be executed by theetching apparatus 400 to etch the wafer the amount specified by the etchdepth at respective radial locations and obtain the target waferprofile. It can be appreciated that the actual thickness at variouslocations across the surface of the substrate can be referred to as a“wafer profile” and, accordingly, the desired amount of material to beremoved at such locations to achieve the target wafer profile iscommonly referred to as the “etch profile.”

An etch recipe consists of a variety of single wafer wet etch processingparameters that control the radial location on the surface of the waferwhere material will be removed and how much material will be removed atsuch locations.

A variety of parameters can be defined and/or adjusted in the etchrecipe to control the radial location on the surface of the substratewhere etching is concentrated and the amount of material removed at thatlocation, including but not limited to, the radial position of the etchtool 430 (also referred to as the arm) and nozzle 435 dispensing thechemical etchant onto the substrate, the path of the etch tool, which isreferred to as the arm scan, the arm scan speed, acceleration,deceleration and nozzle height. It is understood that dispensing anetchant onto a substrate at a particular radial location generallylocalizes the etching process to that particular radius of the substrateand, as such, the position and movement of the arm and nozzle over thewafer (e.g., “arm scan profile”) can control the location of etching.

Arm scan speed is the speed at which the arm and nozzle dispensing thechemical etchant moves from one position on the substrate to another,and acceleration and deceleration is the rate of change of the arm scanspeed over a period of time, and the nozzle height is the distancebetween the nozzle and the substrate.

The parameters that can be adjusted to control etch rate (i.e., the rateat which the substrate material is chemically removed), include but arenot limited to, the etchant selected, the spin speed of the substrate,the concentration of the chemical etchant, the temperature of thechemical etchant, and dwell time.

Spin speed is the speed at which the chuck 420 and the substrate thereonare spinning while chemical etchant is being deposited on the substratesurface. The chemical etchant concentration is the concentration of thechemical etchant that is used to chemically remove the top surface ofthe substrate. KOH (Potassium Hydroxide) is one exemplary etchanttypically used to etch silicon TSV substrates because of its property toetch silicon selectively as opposed to conductors (such as Copper) andinsulators (such as silicon oxide). As discussed herein, the selectionof the etchant can be made in view of the particular stage that theetchant is being used in. For example, the first etchant used in theSpinD stage is selected to accomplish the stated objective of the firstetch stage in that the first etchant has a fast etch rate to remove saidoverburden and is suitable for localized etching to reducenon-uniformities in the radial thickness. The second etch used in thesecond stage is selected to accomplish the stated objective of thesecond etch stage which is a TSV reveal stage. The second etch thusselectively etches the silicon as opposed to the conductors andinsulators, and thereby reveals the TSV as described herein. Otherexemplary etchants are further described herein.

Dwell time is the amount of time the nozzle is dispensing the etchant ona particular radial portion of the substrate. Increasing dwell time at aparticular radial location of the substrate causes the substrate to beetched more at that radial location. Dwell time can be controlled byadjusting process parameters such as arm scan speed, acceleration of thearm (and/or chuck) and the spin speed of the chuck. More specifically,due to the circular shape of the substrate that is spinning on the chuckduring the etching process, less time is required to deposit thechemical etchant necessary to etch the center of the substrate than theedge of the substrate and as such the speed of the arm. Accordingly thetime at a particular radial location as well as the speed andacceleration/deceleration from one radial position to another can beadjusted to vary the amount of time the etchant is dispensed at aparticular radial location.

The parameters that can be adjusted to control the etch uniformity(e.g., the uniformity of the amount etched across respective radiallocations and the thickness of the resulting wafer) include but are notlimited to, the spin speed of the wafer and the dwell time of the armdepositing chemical etchant on the radial locations of the wafer beingetched. For example, in a wafer that is, say, center light (edge heavy),the etch profile can provide that the dwell time is increased near theedge of the wafer, and/or spin speed can be decreased to achieve agreater etch depth at the edge. Referring to the exemplary etch profilefor depicted in FIG. 9G, an etch recipe is generated such that, duringthe Spin-D etch step, the wafer is selectively etched a greater amounttowards the edges of the wafer than is etched in the center region ofthe wafer so as to compensate for the radial location dependentnon-uniformities in thickness and to yield a wafer having the targetthickness characteristic (e.g., target RST for each of the radiallocations and a prescribed thickness uniformity).

Returning to FIG. 8B and step 870, in one or more embodiments,generating an etch recipe can include, characterizing, by the configuredprocessor, the variation in thickness across the wafer based on thethickness measurements and wafer profile resulting from the ensuing etchstep. As previously noted, the grinding process leaves a layer of wafermaterial above the TSVs that can be thicker at various locations on thesurface of the wafer. Accordingly, the configured processor can, basedon the size of the center region defined in the wafer profile andcalculated RST across the wafer, identify the radially defined locationsof the wafer where the overburden is thicker or thinner and characterizethe radially dependent variation in thickness across the wafer. Forinstance, the thickness variation can be characterized as center heavy,uniform, or center light (i.e., edge heavy).

In addition, generating the etch recipe can further include calculatingthe etch time for the Spin-D etching process in view of the average ofRST across the wafer (e.g., beginning wafer thickness) and the firstetch rate (e.g., the etch rate for the Spin-D etching process). Thefollowing is an exemplary equation for calculating Spin-D Etch Time:

${{SpinD}\mspace{14mu}{EtchTime}} = \frac{{average}\left( {{RST}\lbrack x\rbrack} \right)}{FirstEtchRate}$Etch rate can be defined by the user, and can also be calculated as afunction of the concentration of the chemical etchant that is used tochemically remove the top surface of the wafer. Because theconcentration of etchant decreases as wafers are processed, theconfigured processor can store the calculated Spin-D Etch Time andstarting etch rate so that the etch rate can be periodically updated asthe wafers are processed and concentration decreases. The following isan exemplary equation for defining the Previous Spin-D Etch Time:PreviousSpinDEtchTime=SpinDEtchTime

In addition, generating the etch recipe can include selecting, by theconfigured processor, one or more of a number of prescribed etchrecipes. In particular, the etch recipe can be selected based on thedetermined radial thickness variation characteristics. For example,pre-defined etch recipes can be stored in memory that are defined tocompensate for a particular type of radial thickness variation of thewafer. For example, certain etch recipes can be suitable for etching,say, a center heavy wafer, whereas others are more suitable for uniformwafers or center light wafers and the like. In addition, the etch recipecan also be selected or defined based on other parameters, includingwithout limitation, the calculated etch time and the defined etch rate.For example, a particular etch recipe can be pre-defined for processinga wafer that is, say, center heavy and a given calculated etch time, orranges of etch times.

In one or more embodiments, the process controller can generate acustomized etch recipe for the wafer based on the particular etchprofile. In order to generate a custom etch recipe, the processorexecuting one or more software modules 730, including preferably etchrecipe module 778, can configure process controller 705 to define one ormore of the aforementioned parameters that control etching location,etch rate, dwell time and the like to generate an etch recipe toselectively etch the overburden across the radial locations on thesurface of the particular substrate in order to achieve the desired etchdepth at each radial location and intermediate locations. In particular,based on the etch profile, which identifies the radial locations andcorresponding amount of material to be etched at those radial locations,can generate an arm scan profile that defines how the arm should moveacross each of the radial locations and thereby controls the amount ofetchant dispensed at those radial locations (and intermediatelocations).

As noted above, the parameters that can be adjusted to control the etchuniformity (i.e., the uniformity of the etch and thus the thickness ofthe resulting wafer) include but are not limited to, the arm movement,the spin speed of the wafer and the dwell time of the arm depositingchemical etchant on the radial locations of the wafer. For example, in awafer that is, say, edge heavy, the etch profile can provide that thedwell time is increased near the edge of the wafer, and/or spin speedcan be decreased to achieve a greater etch depth at the edge.

It should be understood that the parameters can be defined as a functionof arm location or other variables and are therefore can be variedthroughout the course of the etching process. For example, in asubstrate with a radial thickness that is, say, heavy around aparticular radial location, the etch recipe can provide that the dwelltime is increased at that location by decreasing the speed at which thearm travels across that location to achieve a greater etch depth.

Additionally, the customized etch recipe can include an etch time. Etchduration is the amount of time that the etch process is being performedon the particular substrate and can be varied to control the amount ofmaterial that is removed during the etching process. The longer a givenetch recipe is executed on a substrate the more substrate is removed andas such, the overall thickness is reduced.

Accordingly, the custom etch recipe can be generated by generating anarm scanning profile. In particular, the configured processor can, usingthe thickness measurements and corresponding radial locations, setpoints along a path that the arm will be programmed to pass. Inaddition, based on the etch depth for each of the radial locations, theconfigured processor can also define the speed of the arm as it movesacross each point and in between the points so as to precisely controlthe amount of material etched at each of the radial locations. It canalso be appreciated that the etch recipe including the arm scan profilecan also define other parameters to adjust etch rate for eachpoint/radial location such as spin speed, concentration,acceleration/deceleration and the like as discussed above.

Then at step 875, processor 710, which is configured by executing one ormore software modules 730, including preferably the etching processmodule 776, can cause the etching apparatus 400 to etch the waferaccording to the generated etch recipe and for the calculated Spin-DEtchTime.

After the wafer is processed during the Spin-D etch step, steps 855-875can be repeated for one or more ensuing etch steps, referred to hereinas Etch-1. Preferably the Etch-1 step is the final etch step thatreveals the TSVs to the desired reveal height/depth, however, in someimplementations, prior to performing the Etch-1 reveal etching step,additional Spin-D etch steps can be performed until a wafer having thedesired physical characteristics is achieved.

More specifically, the wafer can be loaded into the scanner andre-measured prior to the in Etch-1 step, for example in a similar manneras steps 855-860. In addition the processor 710, which is configured byexecuting one or more software modules 730, including preferably themeasuring module 770, can determine the PostSpinDThickness. ThePostSpinDThickness can be the Average radial thickness of the wafer(MeasuredThickness) at various radial locations of the wafer.

The processor 710 executing one or more software modules 730, includingpreferably the measuring module 770, wafer profile module 772, the etchrecipe module 774, can analyze the measured thickness in view of theSpin-D process parameters to adjust the spin-D etch recipe forsubsequent wafers. More specifically, the configured processor cancompare the post-processing thickness of the wafer to the implementedetch profile to determine whether the etch recipe executed by theetching apparatus successfully etched the desired amount of wafer at thedesired locations and resulted in a processed wafer having the desiredphysical characteristics, including thickness uniformity. Accordingly,the feedback can be used by the configured processor to adjust the etchrecipe to more effectively etch ensuing wafers. As noted above,depending on the previous Spin-D etch rate and amount of materialetched, the process controller can adjust parameters to maintain a knownor consistent etching environment such as recalculate and/or restore theconcentration of the chemical etchant and adjust chemical etchanttemperature as would be understood by those skilled in the art. Thefollowing is an exemplary equation for re-calculating the Etch Ratebased on the First Etch Rate, the change in wafer thickness and the etchtime of the Spin-D etch process:

${FirstEtchRate} = {\left( {{.9}*{FirstEtchRate}} \right) + {0.1*\left( \frac{{BeginningWaferThickness} - {PostSpinDThickness}}{PreviousSpinDEtchTime} \right)}}$

The processor 710 executing one or more software modules 730, includingpreferably the measuring module 770, wafer profile module 772, an etchrecipe module 774, etch recipe module 774, can also analyze the measuredthickness in view of the target wafer profile for the Etch-1 process(e.g., final wafer profile) to define the etch recipe for the ensuingEtch-1 process. For example, similar to the process described inrelation to step 865 and 870, the configured processor can calculate theetch depth for the Etch-1 process based on the measuredPostSpinDThickness and the Reveal height defined in the wafer profilefor each of the radial locations of the wafer. The following is anexemplary equation for calculating the Etch depth:EtchDepth[x]=Measured[x]−RevealHeight[x]

As previously noted, in some implementations, the Spin-D etch step canbe performed to produce a processed wafer that includes a protectivelayer of substrate material remaining over the top of the TSVs, forinstance, as described herein in relation to FIG. 9I. However, in thealternative, the Spin-D etch step can be configured to partially revealthe TSVs. FIG. 9H depicts a cross section of a portion of an exemplarypost Spin-D wafer 990 prior to the Etch-1 etch step and showingpartially exposed TSVs 995, the measured thickness of the wafer 991, thereveal height 993, the via height 994 the etch depth 992 for the Etch-1etching step and the desired wafer thickness after the Etch-1 etch(e.g., Reveal depth 996).

The processor 710 executing one or more software modules 730 including,preferably the measurement module 770, the wafer profile module 772, andthe user interface module 780, can be configured to output informationconcerning the wafer measurements and calculated thicknesses related tothe ensuing Etch-1 etching steps to an operator/user via the display 740in a variety of graphical formats. For example, FIG. 9I depicts a GUIincluding a graph 1000 of the wafer thickness measurements taken along aradius of the wafer compared to the wafer profile prior to the Etch-1processing step. As shown, the graph depicts the center region 1006, aline corresponding to the TSV height 1007, and a line corresponding tothe reveal depth 1008 (e.g., the final target wafer profile), a linecorresponding to the TSV height plus the etch offset 1009 (e.g., thefirst target wafer profile to be produced by the Spin-D etch) and a linecorresponding to the measured thickness 1005 across the radius of thewafer (e.g., the actual/current thickness after the Spin-D etch).

In addition, as described in relation to step 870, the configuredprocessor can calculate the etch time specifically for the Etch-1process based on the measured PostSpinDThickness and the Reveal Heightdefined in the wafer profile. The following is an exemplary equation forcalculating the Etch-1 Etch time:

${{Etch}\; 1{EtchTime}} = \frac{{average}\left( {{EtchDepth}\lbrack x\rbrack} \right)}{SecondEtchRate}$

In addition the configured processor can select the appropriate etchrecipe based on whether the wafer thickness measurements indicates thatthe wafer is edge heavy (i.e., center light), center heavy (i.e., edgelight) or uniform as described in relation to step 870. The configuredprocessor can also Store the Previous Etch-1 Etch Time, which can beused to adjust the second etch rate after the Etch-1 etch process. Thefollowing is an exemplary equation for defining the Previous Etch-1 Etchtime:PreviousEtch1EtchTime=Etch1EtchTime

It can also be appreciated that, as described in relation to step 870,the configured processor can generate a customized etch recipe includingan arm scan profile that is specifically tailored to the wafer, asmeasured, and in view of the target final wafer profile.

Then at step 880, processor 710 executing one or more software modules730, including preferably etch recipe module 778, can configure processcontroller 705 to cause the etching apparatus 400 to etch the waferaccording to the previously selected etch recipe and the calculated etchtime.

After the wafer is processed in the Etch-1 etch step, at step 885, themeasurement steps 855-865 can be repeated to confirm that the Etch-1process achieved the target final wafer profile. In particular, the postEtch-1 steps can include: position the wafer under the Isis Scanner; setwafer measurement type to “Final;” measure wafer thickness for finalanalysis; determine the PostEtch1Thickness which is the average of themeasured thickness; adjust the second etch rate, for example, accordingto the following equation:SecondEtchRate=(0.9*SecondEtchRate)+0.1*((PostSpinDThickness−PostEtch1Thickness)/PreviousEtch1EtchTime).

In addition, the analysis of the post Etch-1 thickness measurements caninclude validating the wafer's thickness to determine if are all TSVswere revealed and if the wafer meets all the prescribed criteria such asreveal depth, reveal tolerance, uniform thickness tolerance and the liketo determine that the wafer processing has been completed. After a waferis complete, the process can be repeated for subsequent wafers. However,if the wafer requires additional etching, the system can repeat thesteps of calculating etch depth and etch profile and the Etch-1 etchingprocess can be performed again until the wafer is completed.

Accordingly, it can be appreciated that by comparing the post-processingthickness information to the pre-processing thickness information, ateach stage of the etching process in view of the desired results of therespective etch step, the configured processor can determine whether theetch recipe executed by the etching apparatus successfully etched thedesired amount of wafer at the desired locations and resulted in aprocessed wafer having the desired physical characteristics, includingthickness uniformity. Based on the comparison, the configured processorcan adjust the etch recipe for the ensuing etch step to compensate forany deficiencies in the previous etching step. Moreover, as noted above,the configured processor can analyze the thickness measurements takenthroughout the process 850 and adjust the wafer profile parameters andetch recipes for subsequent wafers being processed. For example, theconfigured processor can adjust the first and second etch rate aspreviously mentioned. In addition, information about the actual heightof the TSVs can be input to the wafer profile. In addition, preferably,the first and/or second etch recipes for processing the subsequentwafers can be adjusted based on the actual results from processing thepreceding wafers. More specifically, the processor can compare thepost-etch step thickness measurements to the pre-processing thicknessmeasurements and the respective wafer profiles to determine whether theetch recipe executed by the etching apparatus successfully etched thedesired amount of wafer at the desired locations and resulted in aprocessed wafer having the desired physical characteristics, includingthickness uniformity. In the event that the respective etching stepswere not successful, the process controller can adjust the etch recipesfor subsequent wafers.

Although the process described in relation to step 870-880 includessteps for generating the etch recipe specifically for the Etch-1 etchstep based on the measured PostSpinDThickness of a wafer and whether thepost Spin-D wafer meets the target wafer parameters, it can beappreciated that the steps for calculating a Spin-D etch recipe andetching the wafer in the Spin-D etching step can be repeated until thefirst target wafer profile is met to a prescribed degree. For instance,a wafer having a layer of overburden with the prescribed surfaceroughness and prescribed RST can be achieved through one or morespecifically tailored Spin-D etching steps. As a result, the Etch-1 etchrecipe can be more uniformly applied from wafer to wafer and can beimplemented to produce wafers meeting the target final wafer profileparameters with minimal adjustments to the etch recipe.

Accordingly, system 100 executing process flow 800 and 850 provides afully automated, production grade, solution that: uses specializedmetrology to generate, in real time for each etch step, etch recipesthat are specifically tailored to each wafer based on the etching stepsthat have already been performed on the wafer and/or based on previouslyetched wafers; and etches the wafers using a single wafer wet etchapparatus. As a result, the system can achieve a precise etch depth,thickness uniformity and in general produce higher quality wafers,minimize waste and realize the benefits associated with a single waferwet etch process.

As mentioned above, the measurement steps and etching steps are allperformed as part of an integrated system defined by complementarydevices that are located within a single housing.

At this juncture, it should be noted that although much of the foregoingdescription has been directed to a system for performing a wet etchingprocess and methods for wet etching wafers to reveal TSVs, the systemsand methods disclosed herein can be similarly deployed and/orimplemented in scenarios, situations, and settings far beyond thereferenced scenarios. It can be readily appreciated that the system forperforming a wet etching process can be effectively employed inpractically any scenario in which a wafer is to be etched in one or moresingle wafer wet etching stations to a target wafer profile (e.g., adesired surface roughness, thickness uniformity, reveal height, andoverall thickness and the like).

It can also be readily appreciated that one or more of the stepsdescribed in relation to the step of generating an etch recipe,modifying wafer profiles and arm scan profiles and the like are notlimited to wet etching processes. In particular, generating an arm scanprofile, as described above, can be implemented in practically anyscenario where it is desirable to create a customized path for an arm totravel in a processing environment. For example, an arm scan profile canbe generated substantially in the same manner as described above can beapplied to wafer cleaning applications in which the arm scan profilecontrols the dispensing of cleaning solution onto a wafer. Commonlyowned U.S. patent application No. 62/073,727, incorporated by referencepreviously, discloses the generation of arm scan profiles and theteachings therein can be implemented with the present teachings.

The following examples are exemplary of the implementation of theprocess described herein; however, it will be understood that theseExamples are not limiting of the present invention in any way.

EXAMPLES

Mobility and performance demands from semiconductor end users havecontinually driven the semiconductor device geometry to smallerdimensions. The same pressure has also resulted in many innovations fromthe semiconductor packaging industry. One of these innovations is theThrough Silicon Via (TSV) 3D packaging technology. Through Silicon Viahas become the key enabling technology in 3D packaging by reducinginterconnect length to increase device speed, and by increasinginterconnect density to reduce the package form factor. There are threedifferent integration schemes with the TSV process: via-first,via-middle, and via-last. The via-first process forms the TSV in thesubstrate silicon before the front-end process. The via-middle processforms the TSV at the front end or interconnect steps with the regularwafer process flow. The via-last process makes the TSV from the backsideof the wafer after completing the BEOL processing. In via-first andvia-middle TSV integration flows, Si wafers must be thinned from thebackside to reveal the Cu TSVs for the wafer to make contact withanother wafer or chips. Typically, this thinning is accomplished bygrinding the back side of the wafer, CMP polishing to remove thesubsurface damage and to eliminate stress in the wafer, then etchingwith a plasma or wet process to reveal the Cu TSVs. The CMP processinvolves using expensive slurries and critical post cleaning steps toremove the slurry particles and other introduced contaminants. Dry etchprocesses usually require expensive equipment and etching gases. On theother hand, wet chemicals such as KOH and TMAH have been used ascost-effective wet etch alternatives for plasma etching to reveal theTSV. While KOH is a suitable etchant, during the KOH etching process,the KOH adds metal ion (K+) contamination on wafer surfaces. Typically,a cleaning process is required after the KOH etch, to remove theresidual K+, particularly when KOH is used as to reveal TSVs. Theadditional cleaning process reduces the tool throughput and, therefore,is not desired in mass production. Tetramethylammonium hydroxide (TMAH)has been used to replace the KOH in TSV reveal wet processing toeliminate metal contamination. However, TMAH is toxic. Somesemiconductor fabricators try to avoid it whenever possible. Other TSVreveal etchants are commercially available and suitable for use in thepresent invention, including a TSV reveal etchant that is availableunder the trade name SMC6-42-1 from SACHEM, this etchant does notcontain TMAH or metal-containing (inorganic) hydroxide. As noted above,in performing a reveal etch, the etchant is preferably selective foretching the wafer material (e.g., silicon) and not the material formingthe TSVs including, for example and without limitation, a conductivematerial (e.g., copper) and an oxide liner around the conductivematerial. As further described herein, suitable anisotropic revealetchants include highly alkaline etchants.

Coupon Tests

Coupons of about 20×20 mm made from P-type single-crystal Si wafers with[100] orientation were used in all lab tests. A coupon was premeasuredfor surface area, pretreated with 2% HF to remove native oxide, andpreweighed. The coupon was then submerged in an etch solution in a PTFEbeaker for a specified time. Temperature was controlled at 75° C. forall tests unless otherwise indicated. After the specified etch period,the coupon was removed from the etchant and immediately rinsed with DIwater and then IPA. The coupon was then dried using N2, and weighed tocalculate the total etch amount and etch rate.

Wafer Tests

Ground wafers and Si test wafers (all 300 mm) were etched on acommercial-grade SSEC 3300 ML single-wafer process tool. Process andequipment parameters were developed for optimum etch rate, surfaceroughness, and surface defects. The etch amount was determined using anISIS StraDex f2-300 IR sensor by measuring the pre- and post-etch waferthickness. Surface roughness was measured using a KLA P16 surfaceprofilometer, and reviewed with a Veeco Icon AFM. Surface defects andconditions were reviewed using a Hitachi S-3700N SEM. Finally,production TSV wafers were processed under the optimized chemical andequipment conditions determined using test wafers.

Results and Discussion

Etch Rates and Selectivities

For a successful wet process, a high silicon etch rate is preferablebecause it determines the throughput, one of the key cost factors forthe process. Table 1 compares the [100] Si wafer, thermal oxide (Tox),and Cu (sputtered film) etch rates from exemplary beaker tests.Hydroxide ion, [OH—] is believed to be the dominant active silicon etchspecies in strong base solutions through the following general siliconetch reactionSi+2OH-+2H2O·Si(OH)2O22-+2H2

The [OH—] concentration was kept at the same level (<2M). Temperaturewas maintained at 75-80° C. As the table indicates, the SMC6-42-1 etchrate is about 2× and 4× faster than TMAH and KOH, respectively, at thesame molar concentration. It should be mentioned that KOH etches Si(100) faster at higher concentrations, such as 2.2˜3.6M (12.5-20%).

During the reveal etch, the etchant does not significantly etch theoxide liners that insulates plated copper TSVs from the bulk silicon inthe TSV. This requirement is the main reason that the industry prefersstrong base etchants to acidic etchants based on HF, such as HF/HNO3.

The data from Table 1 suggest that SMC6-42-1 has about the same Tox etchrate as TMAH and KOH, but 2× the selectivity due to a high Si etch rate.Cu etch rates among these etchants are comparable and at a low level of1 nm/min. Under normal circumstances Cu TSVs are not exposed during thereveal etch since the TSVs are covered with oxide. Therefore the Cu etchrate is not as critical as the oxide etch rate.

TABLE 1 Comparison of Si, Tox, and Cu etch rates in beaker tests Si(100) ER Tox ER Cu ER Etchant (nm/min) (nm/min) (nm/min) SMC6 1600 0.111.05 42-1 TMAH 800 0.1 0.9 KOH 363 0.1 1.0

With the promising beaker test results, the new Si etchant was testedusing an SSEC single-wafer processor on regular test wafers and groundwafers. The ground wafers were thinned by Strasbaugh using the samegrinding parameters as for real TSV device wafers. Therefore, thesurface roughness, waviness, texture, and thickness variations are thesame as they would be for TSV wafers. Table 2 summarizes the etch datagenerated in the SSEC single-wafer tool.

TABLE 2 Ground wafer ER in a commercial-grade SSEC single-wafer toolGround Tox OH Wafer ER ER Conc Temp Etchant (nm/min) (nm/min) (M) (° C.)SMC6-42-1 800 0.12 1 95 TMAH 260 0.1 2.8 80 KOH 600 0.1 4.2 72

The data in table 2 indicate that the SMC6-42-1 etches Si significantlyhigher than TMAH and KOH at the conditions tested. It is especiallyinteresting that the higher silicon etch rate of SMC6-42-1 was achievedwith only 1/3 and 1/4 respectively of the TMAH and KOH molarconcentrations.

Significant ER differences were observed between SMC6-42-1 in thecommercial tool and in a beaker test. This is probably due to thetemperature drop of the etching solution when spreading to a thin filmon the wafer surface. In a lab setup, a small coupon is submerged in arelatively large amount of solution kept at constant temperature.

Surface Roughness

Surface roughness affects film deposition following the TSV revealprocess and is preferably tested and tightly controlled in high-volumeproduction. Therefore surface roughness (pre and post etch process) wasmeasured for all wafers tested on the commercial grade SSEC single-waferprocessor using an AFM and/or a profilometer. FIG. 10 shows the surfaceof a TSV wafer after grinding and after the SMC6-42-1 etch (AFM imagesof TSV wafer surface post grind (left) and post 10-μm etch (right)).

As shown in the above images, post-grind TSV wafers appear rough, withvisible grinding marks of maximum peak height up to 50 nm. After a 10 μmchemical etch, the maximum peak is below 15 nm. Most of this roughnessis removed by the chemical etch. Here, the chemical etch process appliedwas a two-step approach. First, the wafer was etched using HF/HNO3 thatetches silicon isotropically at a very fast etch rate, up to 10-μm/min.,depending on the amount of silicon to be removed. The HF-based chemicalcannot be used to reveal the TSV because it would etch the SiO2 linerand the Cu in the TSVs. The isotropic etch is used to quickly smooth outthe peaks and valleys created during the grinding process. Ananisotropic etchant is preferably used to finish etching the remainingsilicon to reveal the TSV. As is well understood, anisotropic etchingleaves well defined pyramids and pits on single crystalline siliconsurfaces. SMC6-42-1 is specially formulated to prevent pit and pyramidformation. However, it will be appreciated as mentioned previously, thatthe above etchants are only exemplary and not limiting of the scope ofthe present invention which is broadly embodied in the method describedherein.

Two wet chemical TSV reveal schemes were tested with the specialformulation of SMC6-42-1. First, wafers were ground then CMP polished,and etched using SMC6-42-1. Second, wafers were ground, then etchedusing HF/HNO3 (isotropic) and followed by the anisotropic chemicaletching process using SMC6-42-1. Both the isotropic and anisotropicetches were conducted in the SSEC single wafer tool. Pre and post etchwafer surface roughness was measured using a profilometer and reportedin the below table. As the data demonstrated, for the Grinding/CMP/Etchprocess, the chemical etch increased the wafer surface roughness (Ra)from about 15 Å to about 23 Å. For the grinding/etch process however,the chemical etch process significantly reduced wafer surface roughnessfrom about 75 Å to 22 Å, about the same with that obtained from thegrinding-CMP-etch process.

Wafer # Process Ra Pre (A) Ra Post (A) 1 Grind/CMP/Etch 19 23.55 2Grind/CMP/Etch 12.5 24.85 3 Grind/CMP/Etch 14.9 26.25 4 Grind/CMP/Etch11.55 18.05 5 Grind/Etch 86.9 22.25 6 Grind/Etch 62.4 21.65 7 Grind/Etch73 27.5 8 Grind/Etch 77.5 16.45

One function of CMP or wet chemical process is to remove the mechanicalsubsurface damage and release subsurface stress caused from the grindingprocess. TEM was used to image the cross section of the wafers postgrinding and post two step wet chemical etch. The TEM results arepresented in the below images (top image below: TEM image of a groundwafer cross section close to the surface; and bottom image below: Crosssection TEM image of a ground wafer after the two-steps wet etch (˜10 μmSi removal).

FIG. 11A shows TEM images of a wafer cross section close to the surface.FIG. 11A clearly shows the subsurface damages up to about 100 nm deep.The subtle contrast change from the surface to the bulk suggests stressexisting at the surface about 300 nm into the bulk. After the two stepwet chemical etch the subsurface damages and stress are removed as shownin the TEM of FIG. 11B. This TEM and the roughness data demonstrate theCMP process step can be replaced with a wet etch process.

TSV Wafer Results

TSV production wafers were received after the grinding process. Thewafers were processed using the two step chemical etch described hereinand in this experiment using HF/HNO3 and SACHEM SMC6-42-1 as the twoetchants. Wafers were successfully processed on the SSEC single-wafertool with the optimum known parameters. The TSVs are revealed cleanlyand the wafer surface is smooth.

SMC6-42-1 is formulated for fast etch rate and smooth surface finishingwithout the use of TMAH. The composition is listed in Table 4. Itstoxicity data for rat dermal exposure, using LD50 as the indicator, ispresented in Table 5.

TABLE 4 SMC6-42-1 Components Component Conc (wt %) Purpose Organic Base8-25 etchant (Non-TMAH) Organic additive <1 Etch enhancement DI Water74-91

TABLE 5 Comparison LD50 for SMC6-42-1 and TMAH Component LD50 (mg/kg)SMC6-42-1 1000 TMAH 157

LD50 is the dosage for 50% or more of test rats to survive after skincontact with the test chemicals in a given time. Generally, the higherthe LD50, the less toxic the chemical. As indicated in Table 5,SMC6-42-1 LD50 for rat dermal exposure is 1000 mg/kg and more than 5times higher than that of TMAH.

Etch Profile Control

Post-grind TSV wafers have significant thickness variations. Thesevariations or non-uniformities may come from the grinders used and/orfrom thickness variations of the adhesive layer used for mounting thedevice wafer to a carrier. These non-uniformities are often radial innature, due to the process that caused them, such as the top curve shownin FIG. 12. In other words, the thickness of the layer of residualsubstrate material (RST) is often generally consistent around aparticular radial location (e.g., a ring shaped area that surrounds thecenter of the wafer at a given distance or ranges of distance from thecenter) but differs from the RST of one or more other radial locations.In this case, the wafer has a center and edge thicker profile. Theincoming thickness variations could cause serious issues such asunrevealed TSVs. To address this non-uniformity issue, the exemplarysingle-wafer process system and methods integrates a wafer-thicknessmeasurement sensor in the system, for example and without limitation,the ISIS StraDex f2-300. The sensor is incorporated in a separatechamber in the system design, thereby eliminating the need for off-linethickness metrology. The ISIS StraDex f2-300 sensor uses spectralcoherence interferometry at a 1300-nm wavelength to obtain thicknessmeasurements. The control system utilizes measurements taken across thediameter of the wafer, for example. A feed-forward control system usespre-processing thickness measurements to adjust the etch depth forspecific radial locations to compensate for incoming thicknessvariation. In addition, a feedback control mechanism utilizes thicknessmeasurements taken post processing to adjust etch times for thesubsequent wafers, thus addressing variations in etch rate. Thisclosed-loop process control is especially important for high-volumemanufacturing. In FIG. 12, (bottom curve) shows the actual measurementresults on a TSV wafer after the reveal etch (FIG. 12 illustrates valuesfor the in-line-measured initial thickness (top curve), via depth/height(middle curve) and post-reveal-etch TSV wafer thickness).

As shown in the above figure, by measuring the incoming wafer thicknessand forward feeding this data to the control algorithm the single-waferprocess system automatically adjusts the process parameters tocompensate for the thicker edge region (e.g., the radial locations inthe range of 100-150 mm from center) and the thicker center region(e.g., the radial locations in the range of 0-50 mm from center). Theresult is a reduction in the post etch thickness variation and uniformlyrevealed TSVs to within ±1.0 μm of the desired reveal height. Thecapability of measuring incoming wafer thickness, and controllingpost-etch wafer thickness and radial profile provides a great advantagein high-volume production.

The reveal etchant does not preferentially attack along the sidewall ofthe TSVs as the etch reveals the TSV. FIG. 13 shows a fracturedcross-section of a TSV that has been revealed. The oxide liner andbarrier metal are intact. No dishing is observed at the intersectionbetween the silicon and TSV.

As described herein, the present invention is directed to a wet etchprocess as a simple and cost-effective alternative to the CMP/plasmaetch TSV reveal process. The process described herein uses two etchingstages and provides an overall fast etch rate and high selectivity,within a single-wafer process tool. The present process improves theetch rate by 50% or more over traditional Si etchants currently used inthe industry. By combining silicon-thickness measurement and wet etch ina single-wafer process system, this platform provides a lower cost ofownership and excellent process control capability for high-volumeproduction.

As mentioned previously, the foregoing example and data is merelyexemplary in nature and not limiting of the scope of the presentinvention.

As described, the two-step (two-stage) etch process includes a firststep that is focused on smoothing the surface and eliminating radiallydependent wafer thickness non-uniformities at a high etch rate (SPIN-Detch). The second step is selective to the substrate material (e.g.,silicon) and without attacking both the oxide liner and the metal studs.For the first step, isotropic wet etching of silicon is used to providea smoothing of the surface roughness, as well as to effect a high etchrate. Any number of different etchants can be used, such as an etchantthat contains a mixture of nitric and hydrofluoric acids as active etchingredients. The nitric acid acts as an oxidizer to convert the surfaceinto silicon oxide and then the HF etches the oxide. For use in asingle-wafer spin processor, the addition of chemicals with higherviscosities provides a more uniform etch of the wafer surface.Phosphoric and sulfuric acids can be added for their viscosity and donot chemically participate in the etching reaction. The addition ofthese viscous acids does not alter the chemical kinetics, but doesincrease the mass-transfer resistance as a result of the increase inviscosity. In addition, the ratios of the chemicals can affect thesurface roughness. At high HF and low nitric acid concentrations, theprocess is very temperature dependent. Further, the reaction rate cannotbe easily controlled, resulting in unstable silicon surfaces. At low HFand high nitric acid content, smooth, polished surfaces result becauseof the more diffusion-limited reaction. With the addition of the viscousacids, the surface roughness decreases more efficiently for the sameremoval rate. The use of a spin etch system allows the optimization ofthis step. Further, the rate of chemical reaction, along with the spinprocess parameters, has significant effect on the overall uniformity andsurface finish. Process conditions can be selected to tailor the etchrate for a smoother surface and to compensate for the non-uniformitiesof the postgrind wafer.

For the second step, as mentioned above, a selective etch process isused to reveal the metal TSVs. The chemistry is selective in that itetches the wafer substrate material and does not attack the oxide lineror metal of the TSV. The silicon surface is clean and smooth, removingthe stress related to grinding. Compensation for radial nonuniformitiesin the silicon thickness and via depths is accomplished by modificationsin the radial etch profile. An integrated wafer thickness measurementsystem provides critical information to control the etching process. Theoxide isolation liner remains intact because of the selectivity of thechemical etching process.

Single-wafer etch processing can compensate for radial non-uniformitiesby etching more or less a specific radial locations across the surfaceof the wafer, depending on the process parameters. This is achievedusing controllable nonlinear motion profiles for chemical dispense asdescribed herein. In fact, this method of compensation is important inorder to provide the etch process. The tools described herein determinethe silicon thickness with integrated infrared measurements. Theintegrated thickness measurement allows a tailored etch recipe to becalculated for each wafer immediately prior to the etch process. Thepost-etch measurement confirms the proper amount of silicon was etched.Measurement of the silicon thickness prior to etching is critical to thereveal process, but must be combined with prior knowledge of the depthof the TSV from the surface. Preferably, the manufacturer has accuratedimensions of the metal stud that forms the TSV. The amount of siliconto be etched is determined based on the depth of the TSV and the desiredheight of the revealed Cu studs after processing.

For the tools described above, a wafer thickness measurement sensor hasbeen incorporated in a separate chamber in the system design in order toprovide closed-loop feed-forward control of the etching process. Thesensor measures the actual thickness of the device wafer, not the entirestack, which includes the carrier and adhesive. Multiple measurementsare taken across the diameter of the wafer. The measurement of the viadepth must be done previously in the front end-of-line (FEOL) processwhen the vias are etched and filled. The data are combined to allow forthe calculation of the silicon etch depth and radial profile.

In one example, the etch rate in a single-wafer etch tool can decreaseover time because of the chemical reactions changing the chemistry. Aconstant etch rate can be maintained by incorporating chemicalreplenishment. To ensure the proper chemical replenishment is takingplace, the etch rate is monitored by measuring the amount of siliconthat was etched on the previous wafer. Thus, the etch rate can becomputed and used for the next wafer to provide closed-loop processcontrol. The projected etch time with radial variation is calculatedusing this etch rate. The variation in radial etch rate is selectedbased on the thickness of the silicon wafer, minus the depth of the TSV,plus the amount of TSV to be revealed. In this example, the TSVs were tobe exposed by 5 μm. The initial thickness variation of the silicon aftergrinding was 4.4 μm. However, the TSV depth variation was 1.5 μm, whichmust also be factored into the etch calculation. Using the same 5μm-reveal example, if the etch had been done without compensation forthe radial variations, the reveal heights would have varied by theinitial 4.4 μm of silicon non-uniformity, as well as the 1.5 μmvariation of the TSVs. Some of the TSVs could be exposed by over 10 μmand could result in mechanical failure during subsequent redistributionlayer (RDL) processing. Using an etch profile to compensate for theincoming silicon thickness variation and the known variation of theTSVs, the resulting reveal heights were within a ±1 μm window around thedesired 5 μm-reveal height.

Continual thickness measurement allows the etch rate to be determinedand not only fed forward for the next wafer to be processed, but alsofactored into the processing of the current wafer. If the final siliconthickness measurement after an etching stage is not withinspecification, the wafer can return to the etch chamber for furtherprocessing.

In one or more embodiments, the software modules 730 can also include anarm scan profile module 782 for generating custom arm scan profiles, asdescribed above and as further described herein.

Custom Arm Scanning Profiles allow the user to graphically create andmodify the path that a dispense arm will travel over a substrate,including at what velocity the arm will be moving at a given point inthe profile. Profiles are dynamically created by the configuredprocessor based on user-interaction with a line chart. The line can beshaped into the desired arm motion profile by click and dragging thepoints that define the line until the desired dispense path is created.Each point in the profile represents the arm's velocity at a givenlocation along the path.

The custom arm scan profiles can be created/modified by the processcontroller 705 based on inputs from the user using the user interfaceand received by the processor 710, which is configured by executing oneor more software modules 730, including, preferably the user interfacemodule 780 and the wafer profile module 772 and the arm scan profilemodule 782.

More specifically, the configured processor can display a graphical userinterface referred to herein as the arm scanning profile wizard throughwhich the user can interact with the system. The “Arm Scanning ProfileWizard” is used to generate a new arm scanning profile that is based ona predefined template. After generation, the default profile can bealtered to fit the dispense application's specific requirements. Inaddition, the user can also input wafer data/parameters. For instance, a“Wafer Information” page can be used to enter, among other things, thewafer's diameter. The diameter units can be selected as either “mm” or“in”.

In regard to the arm scanning profile, the profile can be based on anarm scan template. The configured processor can prompt the user toselect a template and the user can customize the profile after it hasbeen generated from the chosen template. FIG. 14A depicts an exemplaryGUI for the scan path template selection. For example, the templatechoices 1402 can include “Center Heavy”, “Center Light”, and “Linear”(e.g., uniform) that correspond to a characteristic variation inthickness across the surface of the wafer.

When choosing the “Center Heavy” and “Center Light” template, the usercan be prompted to enter the “Min Speed” 1404 and “Max Speed” 1404 thatwill be generated for the profile. For the “Center Heavy” profile, the“Min Speed” represents the arm velocity at the center of the wafer andthe “Max Speed” represents the arm velocity at the edge of the wafer. Itis the opposite case for the “Center Light” profile, where the “MinSpeed” represents the arm velocity at the edge of the wafer while the“Max Speed” represents the arm velocity at the center of the wafer.

When choosing the “Linear” template, the user can be prompted to enterthe “Max Speed”. The “Max Speed” represents the arm velocity that willbe generated in the profile across all locations over the wafer. If allarm motions performed on the left side of the wafer surface will also beperformed on the right side of the wafer surface, then the time tocreate the final profile can be reduced by a user enabling the Symmetryfeature. The Symmetry feature causes the configured processor to reflectall point placements made on the graph for the left side of the wafersurface onto the right side of the wafer surface. A user can click the“Enable Symmetry” checkbox to activate the symmetry function, as shownin FIG. 14A. Based on the received information the graph is displayed tothe user and all point editing operations performed on the left half ofthe graph will be reflected on the right half of the graph. Symmetry canbe toggled ON/OFF at any time for each profile graph. If Symmetry is notenabled, then all areas of the profile graph are available for pointplacement and editing.

The configured processor can generate and display a “Profile Summary”page which displays the list of choices made during the wizard and thesesettings will be used to generate the arm scanning profile. In additionthe configured processor can automatically save a profile when it iscreated with the “Arm Scanning Profile Wizard”.

In addition, arm scan profile data can be automatically imported by theconfigured processor, for example, based on information set forth in thewafer profile described in conjunction with FIG. 8B, in addition oralternatively, the template profile can be imported from the etchprofile, including the arm scan profile generated at step 870.

In addition, arm scan profile data can be imported from a table or fileas provided by the user. In general arm scan profile data can includelocations on the surface of the wafer, and corresponding velocity of thehead at that location. Although such information can be displayed intabular form, the configured processor can display the arm scan profilein graphical form.

The arm scanning profile graph contains a continuous line (either linearor curved) that represents the path of motion that a dispense arm willfollow, including the velocity of the arm at each of a plurality ofpoint locations along the path. As further described herein, inaccordance with one or more of the embodiments of the invention, theprofile path can be changed by editing and deleting existing points andby adding new points by a user interacting with the graphicalrepresentation of the path. The user interactions are received by theconfigured processor and the interactions are converted intocorresponding adjustments to the arm scan profile by modifying thelocations that the point corresponds to and corresponding speed based onthe user interaction with the point on the graph as further describedherein. Several features allow for a high-degree of customization.Moreover, in accordance with the disclosed embodiments, the presentapplication operates beyond simple drag-and-drop functionality, forexample by tracking a relative position where a selection is initiatedand a subsequent relative position where the selection is completed(i.e. the click is released) and determining the validity of suchmodifications. At the point of release, the adjustment can be translatedinto corresponding arm scan parameters and upon completion of themodifications to the arm scan profile, updated instructions can begenerated and can be sent to one or more devices configured to carry outthe process.

FIG. 14B depicts an exemplary graph of an arm scan profile displayed tothe user via the GUI. The graph's x-axis 1410 represents the location ofthe dispense arm across a diameter of the wafer surface. Location valuesare relative to the center of the wafer, with 0.00 shown at the midpointof the axis. Referencing locations in this manner allows a singleprofile to be applied to multiple process chambers.

The example shown in FIG. 14B and further described here represents a200 mm wafer. Note that the x-axis appears to be set to a 250 mm wafer,as the axis values range from −125.00 mm to 125.00 mm. This is due tothe fact that extra distance is added at the end of each side of theaxis to allow the arm to begin and end motion beyond the wafer edges andto give the arm the distance required to be at full speed when the waferedge (represented as the point at −100 mm and 100 mm) is reached duringthe dispense function. The areas of the graph that represent locationsthat are not coincident with the wafer surface (e.g., beyond 100 mm fromcenter) can be colored with a light-yellow fill or shading.

The graph's y-axis represents the velocity that the arm will be movingat the given x-axis location value. Please note that although thelocation values of the first and last points in the graph can bechanged, their velocity values are preferably set to the allowed minimumand the graph can be configured to not allow the velocity value to bealtered for these points.

As previously noted, the Symmetry feature automatically reflects changesmade to the profile on the left half of the wafer over to the right halfof the wafer. This allows for a symmetric profile path across the centerof the wafer. With Symmetry enabled, the right half of the graph canbecomes disabled and point changes are not allowed in that area (or viceversa). The area is shaded a light gray to further indicate thatSymmetry is active. FIG. 14C depicts the graph and outlines the disabledright half of the graph 1414.

A user can also click the “Symmetry” checkbox to disable Symmetry. WithSymmetry disabled, the right side of the profile graph will becomeenabled and the points reflected from the left half of the graph will beavailable for individual editing. If Symmetry is re-enabled, then allpoints on the right half of the graph will be replaced with reflectedpoints from the left half of the graph.

If the Symmetry feature is enabled, the configured processor willreflect all point locations on the left half of the graph onto the righthalf of the graph. As the dispense arm sweeps back and forth, dispensingmay occur near edge locations for a longer period of time as the armdecelerates to a stop and then again accelerates to move in the oppositedirection. To help alleviate over-etching in this case, an exclusionarea can be created or modified by the user by sliding the ExclusionBorder to the desired place on the graph. The exclusion border 1416 ishighlighted in FIG. 14D. Points within the exclusion area are notincluded when the dispense path is executed, meaning the nozzle does notdispense etchant over the locations within the dispense path.

As shown in FIG. 14C, the top of the Exclusion Border contains a grabbar 1418. A user can click and hold the grab bar and then move the mouseacross the x-axis of the graph to change the position of the ExclusionBorder. On the GUI, the exclusion area can appear dark grey and alllocations within the exclusion area will be removed, except for a singlelocation, placed at the minimum allowed velocity value, so thatdeceleration/acceleration of the arm as direction is changed canproperly occur. An example of an applied exclusion area (greyed out) isshown in FIG. 14E. Accordingly, such graphically input instructions arereceived by the configured processor and corresponding adjustments aremade to the corresponding points of the arm scan profile.

In addition, the configured processor facilitates a system in whichprofile points along the arm scan path can be added, edited and deletedin order to create an arm scanning profile that fits the requirements ofa given process.

Via the user interface a user can click on a point in the graph area toselect it. As shown in FIG. 14F the selected point 1420 will appearhighlighted and its location and velocity values will appear in the“Location” and “Velocity” edit boxes in the “Selected Point” area 1422to the right of the graph. If Symmetry is enabled, only points on theleft half of the graph may be selected. If no point is currentlyselected, then the “Selected Point” edit boxes will become disabled.

A point's location and velocity value can be changed using two differentmethods. A user can click and drag a point horizontally across the graphto change the arm location for that point in the arm scanning profile. Auser can click and drag a point vertically to change the arm velocity atthat point's location in the profile. As a point is dragged, itschanging location and velocity values will be displayed in the “SelectedPoint” edit boxes.

As shown in FIG. 14G, a point 1426 will appear highlighted as it isbeing dragged with the mouse cursor, and a dashed line will connect itto the point at its original position 1428. Solid lines will alsoconnect the point being dragged to the points adjacent to it, so thatthe user can get a visual feel for what the result will be when themouse button is released. The configured processor will receive the userinput and convert the user input into corresponding location andvelocity values so as to update the profile according to the user input.In addition the configured processor can also verify the validity of theuser's input and corresponding change to the velocity and location. Forexample, the operational constraints of the arm can include a maximumacceleration over a given distance. Accordingly, the configuredprocessor can determine if the change in location and change in velocitybetween the point being adjusted 1428 and the preceding point 1430 orsubsequent point 1432 violates any such constraint. It can beappreciated that other such processing constraints can be monitored bythe configured processor. For example, the system can also prevent apoint from being moved to a location beyond the preceding or subsequentpoint.

As a warning, the configured processor can display an alert, forexample, a point will appear in a different color if it is dragged to aposition where the value of the acceleration to or from the point isgreater than the recommended maximum. Relocation of a point to such aposition is not required to be prevented by the system. However, thedispense arm may not be able to execute the motion successfully.

In addition, changes to location and velocity can be adjusted manuallyusing the selected point area on the GUI. For example a user can click apoint 1428 to select it and the point's location and velocity valueswill appear in the “Selected Point” area 1422. The user can then enterthe desired location and velocity values for the selected point into theedit boxes. The user may also use the up/down arrows in each edit box tochange the location and velocity values. If symmetry is enabled, thenany point changes made on the left half of the graph will automaticallyreflected by the configured processor onto the right half of the graph.

In addition, points may be added to the graph line, for example toincrease the resolution of the arm scan profile by placing the mousepointer over any line segment between two adjacent points (e.g., segment1434) and providing a user input instructing the processor to add apoint, say, clicking the left mouse button. The added point will beautomatically selected and can appear lime-green. As a result, theconfigured processor will update the arm scan with the new point andcorresponding velocity by inserting an entry into the arm scan profilewith the corresponding location and velocity value between the existingpoints. Similarly, a point may be deleted from the line graph by a userplacing the mouse pointer over the desired point and then clicking theright mouse button. For example, as shown in FIG. 14H, the point 1436will be selected and a context menu will appear. The user can thenselect “Delete” from the context menu to delete the point and thenconfirm deletion. In addition, the graph's current units selection canbe changed between “mm” and “inches” at any time by a user interactingwith the dropdown list located near the bottom right corner of thewindow. Based on such input, all point values and graph axes values willbe converted to the new units being selected by the configured processorand automatically save the updated units to the arm scanning profile.

The Arm scan profile module also configures the processor to provide anumber of Arm Scanning Profile Configuration Options. Profileconfiguration options can include defining the number of points togenerate for center heavy and center light profiles.

In some implementations, by default, twenty profile points along thecontinuous arm scan path are generated when the “Center Heavy” or“Center Light” template has been selected in the “Arm Scanning ProfileWizard”. However, the default number of points to generate can bechanged to any value, for instance, between 10 and 64 points, inclusive.Profiles generated using the Linear template are created with fourpoints. In some implementations, this value cannot be changed, however,points can be edited, added and deleted from the profile after it hasbeen generated. FIG. 14I depicts an exemplary graphical display of alinear template.

As noted above, the configured processor can enforce restrictions on themodifications to the location and corresponding velocity of a point onthe path. By default, the user can drag and drop points anywhere on thegraph, without regard to the location of adjacent points. This freehandapproach allows the user the most flexibility when creating an armscanning profile. However, it would be the user's responsibility toensure that all points are placed in increasing location value from leftto right. However, the configured processor can evaluate the modifiedprofile and, if this criteria is not met, display a dialog warning theuser attempts to implement the profile in the system 100. The ability toenforce relative point placement can be enabled by a user input/command,for instance, clicking an “Enforce Relative Point Placement” checkbox inthe GUI. When checked, the processor prevents a point from being movedto the other side of each of its adjacent points.

At this juncture, it should be noted that although much of the foregoingdescription has been directed to a system for performing a wet etchingprocess and methods for wet etching wafers to reveal TSVs, the systemsand methods disclosed herein can be similarly deployed and/orimplemented in scenarios, situations, and settings far beyond thereferenced scenarios. It can be readily appreciated that the system forperforming a wet etching process can be effectively employed inpractically any scenario in which a wafer is to be etched in a singlewafer wet etching station to a desired surface uniformity and thickness.

It can also be readily appreciated that one or more of the stepsdescribed in relation to the step of generating an etch recipe,modifying wafer profiles and arm scan profiles and the like are notlimited to wet etching processes. In particular, generating an arm scanprofile, as described above, can be implemented in practically anyscenario where it is desirable to create a customized path for an arm totravel in a processing environment. For example, an arm scan profile canbe generated substantially in the same manner as described above can beapplied to wafer cleaning applications in which the arm scan profilecontrols the dispensing of cleaning solution onto a wafer.

It is to be understood that like numerals in the drawings represent likeelements through the several figures, and that not all components and/orsteps described and illustrated with reference to the figures arerequired for all embodiments or arrangements.

Thus, illustrative embodiments and arrangements of the present systemsand methods provide a system, processes and computer implemented controlmethods, computer system, and computer program product for wet etchingwafers. The flowchart and block diagrams in the figures illustrate thearchitecture, functionality, and operation of possible implementationsof systems, methods and computer program products according to variousembodiments and arrangements. In this regard, each block in theflowchart or block diagrams as it relates to a computer implementedmethod can represent a module, segment, or portion of code, whichcomprises one or more executable instructions for implementing thespecified logical function(s).

It should also be noted that, in some alternative implementations, thefunctions noted in the block may occur out of the order noted in thefigures. For example, two blocks shown in succession may, in fact, beexecuted substantially concurrently, or the blocks may sometimes beexecuted in the reverse order, depending upon the functionalityinvolved. It will also be noted that each block of the block diagramsand/or flowchart illustration, and combinations of blocks in the blockdiagrams and/or flowchart illustration, can be implemented by specialpurpose hardware-based systems that perform the specified functions oracts, or combinations of special purpose hardware and computerinstructions.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of the invention. Asused herein, the singular forms “a”, “an” and “the” are intended toinclude the plural forms as well, unless the context clearly indicatesotherwise. It will be further understood that the terms “comprises”and/or “comprising”, when used in this specification, specify thepresence of stated features, integers, steps, operations, elements,and/or components, but do not preclude the presence or addition of oneor more other features, integers, steps, operations, elements,components, and/or groups thereof.

Also, the phraseology and terminology used herein is for the purpose ofdescription and should not be regarded as limiting. The use of“including,” “comprising,” or “having,” “containing,” “involving,” andvariations thereof herein, is meant to encompass the items listedthereafter and equivalents thereof as well as additional items.

The subject matter described above is provided by way of illustrationonly and should not be construed as limiting. Various modifications andchanges can be made to the subject matter described herein withoutfollowing the example embodiments and applications illustrated anddescribed, and without departing from the true spirit and scope of thepresent invention, which is set forth in the following claims.

What is claimed:
 1. A method for wet-etching a wafer according to acustomized arm scan profile using a wafer wet etching processing systemthat includes a plurality of stations, the method comprising the stepsof: providing, at a process controller including a memory and aprocessor configured by executing instructions in the form of codetherein, a wafer profile defining a target thickness of the wafer ateach of a plurality of radial locations on a surface of the wafer aftera first etching step and an initial thickness of the wafer at each ofthe plurality of radial locations; identifying, with the processor, acharacteristic variation in thickness across each of the plurality ofradial locations, wherein the variation in thickness is determined basedon a respective difference between the measured initial thickness andthe target thickness of the wafer at each of the plurality of radiallocations; selecting, using the configured processor, an arm scanprofile according to the identified characteristic variation inthickness across each of the plurality of radial locations; displaying,by the processor on a display, an interactive graphical representationof the arm-scan profile, wherein the arm scan profile is represented asa chart including a plurality of points each of which has a respectivefirst value on a first axis that corresponds to a respective radiallocation parameter and a respective second value on a second axis thatcorresponds to a respective arm scan speed parameter at the respectiveradial location of the plurality of radial locations; receiving at theprocessor, a user interaction with a particular point on the graphicalrepresentation of the arm scan profile, wherein the user interactionincludes a manipulation of one or more of the respective first value andthe respective second value for the particular point; updating, with theprocessor according to the manipulation of the one or more of therespective first value and the respective second value for theparticular point, one or more of the respective radial locationparameter and the arm scan speed parameter in the arm scan profile; andetching the wafer using the wafer wet etching apparatus according to theupdated arm scan profile, wherein the arm scan profile controls movementof the arm during the first etching step causing a nozzle to selectivelydispense a first etchant onto each of the plurality of radial locationsthereby selectively thinning the wafer at each radial location.
 2. Themethod of claim 1, wherein each of the plurality of radial locations isan annular area on the surface of the wafer that surrounds the center ata given radial distance or range of radial distances from the center. 3.The method of claim 1, wherein the arm scan profile causes the nozzle toselectively dispense a respective amount of the first etchant onto eachof the plurality of radial locations, wherein the respective amount ofthe first etchant dispensed onto a particular radial location is afunction of the respective arm scan speed parameter.
 4. The method ofclaim 1, wherein providing the initial thickness at each of theplurality of radial locations comprises: measuring, at a measuringstation, the thickness of the substrate at each of the plurality ofradial locations and recording the measured thicknesses.
 5. The methodof claim 1, wherein the characteristic variation in thickness comprisesone or more of: uniform, edge heavy, edge light, center heavy, andcenter light.
 6. The method of claim 1, wherein identifying thecharacteristic variation in thickness comprises: calculating, with theprocessor, an etch depth for each of the plurality of radial locations,wherein the etch depth for a particular radial location is thedifference between the measured initial thickness at the particularradial location and the target thickness at the particular radiallocation of the wafer, and wherein the etch-depths are non-uniform; andcomparing the calculated etch depths for each of the plurality of radiallocations to identify variations in etch depth as a function of radiallocation.
 7. The method of claim 6, further comprising: calculating afirst etch time as a function of the calculated first etch depths and afirst etch rate for the first etchant, and wherein the wafer is etchedduring the etching step according to the arm scan profile and for thecalculated first etch time.
 8. The method of claim 7, furthercomprising: defining the radial location parameters of the arm scanprofile to position the nozzle over each of the plurality radiallocations; defining, for each of the plurality of radial locations, thecorresponding arm scan speed parameter as a function of the calculatedetch depths; and wherein the radial location parameters, the arm scanspeed parameters and the etch time controls the amount of etchant thatis dispensed onto respective radial locations during etching and theetch depth at respective radial locations.
 9. The method of claim 1,wherein the user interaction is a selection of the particular point ofthe chart and a relocation of the particular point along one or more ofthe axes, and further comprising: tracking a change in position betweenwhere the selection of the particular point is initiated to a relocatedposition upon completion of the selection; and wherein the updating stepfurther comprises: translating the change in position of the point alongone or more of the axes into a modified value for one or more of therespective radial location parameter and the respective arm scan speedparameter.
 10. The method of claim 9, wherein the updating step furthercomprises: updating one or more of a respective radial locationparameter and a respective arm scan speed parameter for one or more ofthe plurality of radial locations that precede or follow the particularpoint in the arm scan profile.
 11. The method of claim 9, wherein theupdating step further comprises: determining, by the processor prior tothe etching step, whether the modified value of the one or more of therespective radial location parameter and the respective arm scan speedparameter is valid according to predefined criteria; and if theparameter is valid, updating the arm scan profile with the modifiedvalue, and otherwise, rejecting the modification and providing anotification on the display.
 12. The method of claim 11, wherein thepredefined constraints include one or more of: a limit of the speed ofthe arm, a limit of the acceleration of the arm, a conflict between themodified radial location parameter and a respective radial location ofthe plurality of radial locations for one or more other points in thearm scan profile, and wherein the limit of the acceleration of the armis determined as a function of a radial location parameter and an armscan speed parameter at another point in the arm scan profile thatprecedes or follows the particular point.
 13. The method of claim 1,wherein selecting an arm scan profile further comprises: receiving, withthe processor from a user interface, a selection of the arm scan profiletemplate; and selecting the arm scan profile according to the waferprofile and the user selection.
 14. A method for wet-etching a waferaccording to a customized arm scan profile using a single wafer wetetching processing system, the method comprising the steps of:selecting, using the configured processor, an arm scan profile;displaying, by the processor on a display, an interactive graphicalrepresentation of the selected arm-scan profile, wherein the arm scanprofile is represented as a chart including a plurality of points eachof which has a respective first value on a first axis that correspondsto a respective radial location parameter and a respective second valueon a second axis that corresponds to a respective arm scan speedparameter at the respective radial location of a plurality of radiallocations; receiving at the processor, a user interaction with aparticular point on the graphical representation of the arm scanprofile, wherein the user interaction includes a manipulation of one ormore of the respective first value and the respective second value forthe particular point; updating, with the processor according to themanipulation of the one or more of the respective first value and therespective second value for the particular point, one or more of therespective radial location parameter and the arm scan speed parameter inthe arm scan profile; and etching the wafer using the single wafer wetetching apparatus according to the updated arm scan profile, wherein thearm scan profile controls movement of the arm during the first etchingstep causing a nozzle to selectively dispense a first etchant onto eachof the plurality of radial locations thereby selectively thinning thewafer at each radial location.
 15. The method of claim 14, wherein eachof the plurality of radial locations is an annular area on the surfaceof the wafer that surrounds the center at a given radial distance orrange of radial distances from the center.
 16. The method of claim 14,wherein the arm scan profile causes the nozzle to selectively dispense arespective amount of the first etchant onto each of the plurality ofradial locations, wherein the respective amount of the first etchantdispensed onto a particular radial location is a function of therespective arm scan speed parameter.
 17. The method of claim 14, furthercomprising: measuring, at a measuring station, the thickness of thewafer at each of the plurality of radial locations and recording themeasured thicknesses.
 18. The method of claim 17, further comprising:calculating, with the processor, an etch depth for each of the pluralityof radial locations, wherein the etch depth for a particular radiallocation is the difference between the measured initial thickness at theparticular radial location and a target thickness at the particularradial location of the wafer, and wherein the etch-depths arenon-uniform.
 19. The method of claim 18, further comprising: calculatinga first etch time as a function of the calculated first etch depths anda first etch rate for the first etchant, and wherein the wafer is etchedduring the etching step according to the arm scan profile and for thecalculated first etch time.
 20. The method of claim 19, furthercomprising: defining the radial location parameters of the arm scanprofile to position the nozzle over each of the plurality of radiallocations; defining, for each of the plurality of radial locations, thecorresponding arm scan speed parameter as a function of the calculatedetch depths; and wherein the radial location parameters, the arm scanspeed parameters and the etch time controls the amount of etchant thatis dispensed onto respective radial locations during etching and thedepth of wafer material etched at respective radial locations.
 21. Themethod of claim 14, wherein the user interaction is a selection of theparticular point of the chart and a relocation of the particular pointalong one or more of the axes, and further comprising: tracking a changein position between where the selection of the particular point isinitiated to a relocated position upon completion of the selection; andwherein the updating step further comprises: translating the change inposition of the point along one or more of the axes into a modifiedvalue for one or more of the respective radial location parameter andthe respective arm scan speed parameter.
 22. The method of claim 21,wherein the updating step further comprises: updating one or more of arespective radial location parameter and a respective arm scan speedparameter for one or more of the plurality of radial locations thatprecede or follow the particular point in the arm scan profile.
 23. Themethod of claim 21, wherein the updating step further comprises:determining, by the processor prior to the etching step, whether themodified value of the one or more of the respective radial locationparameter and the respective arm scan speed parameter is valid accordingto predefined criteria; and if the parameter is valid, updating the armscan profile with the modified value, and otherwise, rejecting themodification and providing a notification on the display.
 24. The methodof claim 23, wherein the predefined constraints include one or more of:a limit of the speed of the arm, a limit of the acceleration of the arm,a conflict between the modified radial location parameter and arespective radial location for one or more other points in the arm scanprofile, and wherein the limit of the acceleration of the arm isdetermined as a function of a radial location parameter and an arm scanspeed parameter at another point in the arm scan profile that precedesor follows the particular point.
 25. The method of claim 17, whereinselecting the arm scan profile further comprises: receiving, with theprocessor from a user interface, a user selection of the arm scanprofile template; and selecting, with the processor from database of armscan profiles, the arm scan profile according to the wafer profile andthe user selection.
 26. A method for performing an operation on a waferusing a dispensing arm and according to a customized arm scan profileusing a processing system that includes a plurality of stations andincludes a process controller having a memory and a processor configuredby executing instructions in the form of code therein, the methodcomprising the steps of: selecting, using the configured processor, anarm scan profile; displaying, by the processor on a display, aninteractive graphical representation of the arm-scan profile, whereinthe arm scan profile is represented as a chart including a plurality ofpoints each of which has a respective first value on a first axis thatcorresponds to a respective radial location parameter relative to asurface of the wafer and a respective second value on a second axis thatcorresponds to a respective arm scan speed parameter at the respectiveradial location; receiving at the processor, a user interaction with aparticular point on the graphical representation of the arm scanprofile, wherein the user interaction includes a manipulation of one ormore of the respective first value and the respective second value forthe particular point; updating, with the processor according to themanipulation of the one or more of the respective first value and therespective second value for the particular point, one or more of therespective radial location parameter and the arm scan speed parameter inthe arm scan profile; and performing the operation on the wafer usingthe processing system according to the updated arm scan profile, whereinthe arm scan profile controls movement of the dispensing arm duringperformance of the operation.
 27. The method of claim 26, wherein theoperation comprises wet-etching the wafer.